Patents Assigned to Syn Labs, Inc.
  • Silicon containing resists
    Patent number: 4764247
    Abstract: The fabrication of improved semiconductor devices having photoresist materials in the form of silicon containing polystyrene copolymers of a halomethylstyrene and an alkylsilylstyrene and the resulting improved semiconductor wafer device containing silicon prior to etching; the resulting resist having reduced resist erosion and improved plasma resiliency.
    Type: Grant
    Filed: March 18, 1987
    Date of Patent: August 16, 1988
    Assignee: Syn Labs, Inc.
    Inventors: Carina T. Leveriza, Russell A. Morgan