Abstract: The present application relates to a method for resource controlling comprising controlling the processing of requests of a first category having a first priority. The method comprises controlling the processing of requests of a second category having a second priority, wherein the first priority is set such that processing the requests of the first category has priority over processing the requests of the second category. The method comprises blocking requests of the first category by a mechanism that detects when a predefined condition regarding the service provided to the second category is met.

Abstract: An integrated circuit for generating a negative bitline voltage comprises a bitline connectable to a memory cell and a multitude of capacitors arranged in groups thereof connected to the bitline. A step signal generator can generate a consecutive sequence of step signals to be applied to a group of capacitors. The circuit may be part of an integrated memory circuit device to drive the bitline to a negative voltage to implement a write assist scheme.

Abstract: A photolithographic modeling process is disclosed. Optical and non-optical parts of a model of the photolithographic process are calibrated. With the non-optical part of the model one or more model corrections are determined between (i) modeled critical dimension data from an aerial image generated by the optical part of the model, and (ii) empirical critical dimension data from tangible structures made at only a first process combination of a first dose and a first defocus in the photolithographic process. Critical dimension data of the photolithographic process are predicted at a second process combination of a second dose and a second defocus in the photolithographic process.

Abstract: Verification-result ranking techniques for root cause analysis are disclosed using violation report analysis and violation weighting. Violation reports are unwieldy and result from a variety of design and process checks. The check coverage can overlap, causing a specific violation to trigger multiple reported violations. High turn around times for violation report analysis increase the risk that selective violation analysis will inadvertently suppress real design bugs. This reduces the odds that static checker reports alone will meet design sign-off criteria. Determining relationships among a plurality of violations for a design permits clustering violations into hot spots. Identification of primary and subsequent contributors to the plurality of violations is based on the relationships among violations. The hot spot with the highest weight is identified, and then subsequent violations are identified to maximize violation coverage.

Abstract: Methods and apparatuses to place and route cells on integrated circuit chips along paths is described. In one embodiment, the method to layout an integrated circuit, the method comprises routing a wire to connect a first cell of the integrated circuit and a second cell of the integrated circuit, and placing a third cell of the integrated circuit after said routing the wire to connect the first cell and the second cell.

Abstract: A global optimization method to synthesize and balance the clock systems in a multimode, multi-corner, and multi-domain design environment is described. The method builds a graph representation for a clock network. The method determines an optimal clock network balancing solution for the clock network by applying linear programming to the graph. To apply linear programming to the graph, the method generates a set of constraints for the graph and determines a proper insertion delay for each edge of the graph by solving for a minimal skew based on the set of constraints. The method implements the optimal clock network balancing solution.

Abstract: A level shifter circuit for low power applications that can shift the level of a digital signal that is below the threshold voltage of output transistors. The level shifter uses core transistors in the input stage and includes an intermediate stage that limits the voltage applied to the drain of the core transistors. The intermediate stage may include two transistors whose gate is connected to a reference voltage and turns off when the voltage at their source is equal to a threshold voltage below the reference voltage, thus limiting the maximum voltage applied to the transistors present in the input stage.

Abstract: Roughly described, a design rule data set is developed offline from the design rules of a target fabrication process. A design rule checking method involves traversing the corners of shapes in a layout region, and for each corner, populating a layout topology database with values that depend on respective corner locations. After the layout topology database is populated, the values are compared to values in the design rule data set to detect any design rule violations. Violations can be reported in real time, while the user is manually editing the layout. Preferably corner traversal is performed using scan lines oriented perpendicularly to edge orientations, and scanning in the direction of the edge orientations. Scans stop only at corner positions and populate the layout topology database with what information can be gleaned based on the current scan line. The different scans need not reach each corner simultaneously.

Abstract: Embodiments relate to a nonvolatile memory (“NVM”) bitcell with a replacement metal control gate and an additional floating gate. The bitcell may be created using a standard complementary metal-oxide-semiconductor manufacturing processes (“CMOS processes”) without any additional process steps, thereby reducing the cost and time associated with fabricating a semiconductor device incorporating the NVM bitcell.

Abstract: Techniques for compacting routing in lower level blocks to free routing resources for upper level blocks are disclosed. In some embodiments, a specification of a hierarchical integrated circuit design comprising a lower level block and an upper level block is obtained. The specification includes an initial routing plan for the lower level block. Subsequently, a compacted routing plan for the lower level block using constrained routing resources comprising fewer routing tracks than the initial routing plan and resulting in at least one unused track as well as a routing plan for the upper level block using the at least one unused track are generated.

Abstract: A method for detecting anomalies in signal behaviors in a simulation of a low power IC includes receiving a circuit design and a power specification of the IC, determining at least one power sequence checking rule from the power specification, simulating the circuit design and the power specification to obtain a dump file, identifying at least one anomaly of the at least one power sequence checking rule based on the dump file, and generating information relevant to the identified anomaly of the at least one power sequence checking rule. The method further includes setting up a context in a debugger for debugging the anomaly by displaying a waveform of misbehaved signals associated with the anomaly in a waveform window, and a portion of the circuit design and/or a portion of the power specification associated with the anomaly in a text window.

Abstract: Defect characterization is a useful tool for analyzing and improving fabrication for semiconductor chips. By using layout and netlist in combination with images of semiconductors, defects can be identified and analyzed. Electrical simulation can be performed on the netlist, based on the presence of the defect that was detected. Layout geometries where the defect was detected can be binned and a search can be performed of the remainder of the layout for similar groupings of layout geometries. Various representations of the semiconductor can be cross mapped, including layout, schematic, and netlist. The presence of certain defects can be correlated to yield, performance, and other characteristics.

Abstract: Disclosed herein are methods and devices used for the physical design validation of integrated circuits. One method used for the physical design validation of integrated circuits includes comparing the original circuit netlist of an integrated circuit and the layout data of the integrated circuit and assigning labels to the input and output terminals of the components in the integrated circuit based on the results of the comparison.

Abstract: Mask design techniques for detection and removal of undesirable artifacts in SADP processes using multiple patterns are disclosed. Artifacts or spurs result from lithographic and chemical processing of semiconducting wafers. The spurs are undesirable because they can cause unwanted connections or act as electrical antennas. Spurs are detected using rule-based techniques and reduced by modifying lithographic masks. The severity of the detected spurs is determined, again using rule-based techniques. The effects of detected spurs can be reduced by modifying the decomposition of the drawn patterns into the two masks used for lithography. Mandrel masks are modified by add dummy mandrel material, and trim masks are modified by removing trim material. The resulting multi-pattern arrangement is used to fabricate the critical design elements that make up the semiconductor wafers.

Abstract: Systems and techniques are described for optimizing a circuit design by using a numerical solver. The gates sizes are optimized by modeling a set of gate optimization problems and solving the set of gate optimization problems by using a numerical solver. The optimization can be performed iteratively, wherein in each iteration a gate optimization problem can be modeled for the portion of the circuit design based on circuit information for the portion of the circuit design. An objective function can be created, wherein the objective function includes at least one penalty function that imposes a lower and/or upper bound on at least one variable that is being optimized. In some embodiments, gradients of the objective function, which includes the penalty function, can be computed to enable the use of a conjugate-gradient-based numerical solver.

Abstract: Systems and techniques are described for optimizing a circuit design by using a numerical solver. Some embodiments construct a set of lower bound expressions for a parameter that is used in an approximation of an objective function. Next, the embodiments evaluate the set of lower bound expressions to obtain a set of lower bound values. The embodiments then determine a maximum lower bound value from the set of lower bound values. Next, while solving a gate sizing problem using the numerical solver, the embodiments evaluate the approximate objective function and the partial derivatives of the approximate objective function by using the maximum lower bound value of the parameter. The maximum lower bound value of this parameter determines the accuracy of the approximation of the objective function.

Abstract: One embodiment of the present invention provides systems and techniques to execute a hardware simulation and verification solution on a multiprocessor system. The hardware simulation and verification solution can be partitioned into different modules which can include a simulation kernel to simulate changes in signal values, a value change dump module to store the changes in the signal values on a computer-readable storage medium, a functional coverage module to check functionality, a toggle coverage module to check signal toggling, an assertion engine to check complex behaviors, and a testbench module to generate test scenarios. Embodiments of the present invention can execute different modules on different processors, thereby improving performance.

Abstract: Mask design techniques for detection and removal of undesirable artifacts in SADP processes using multiple patterns are disclosed. Artifacts or spurs result from lithographic and chemical processing of semiconducting wafers. The spurs are undesirable because they can cause unwanted connections or act as electrical antennas. Spurs are detected using rule-based techniques and reduced by modifying lithographic masks. The severity of the detected spurs is determined, again using rule-based techniques. The effects of detected spurs can be reduced by modifying the decomposition of the drawn patterns into the two masks used for lithography. Mandrel masks are modified by add dummy mandrel material, and trim masks are modified by removing trim material. The resulting multi-pattern arrangement is used to fabricate the critical design elements that make up the semiconductor wafers.

Abstract: According to one embodiment of the present invention, a computer-implemented method for validating a design includes generating, using the computer, a first graph representative of the design, when the computer is invoked to validate the design, and decompose, using the computer, the first graph into at least three sets using a hybrid evolutionary algorithm to form a colored graph.

Abstract: A method, system or computer usable program product for building a fast lithography OPC model that predicts semiconductor manufacturing process outputs on silicon wafers including providing a first principles model of the semiconductor manufacturing process, providing a set of empirical data for storage in memory, utilizing a processor to develop a rigorous model for a process condition from the first principles model and the set of empirical data, and utilizing the processor running the rigorous model to generate emulated data for the process condition to develop a virtual model for predicting the semiconductor manufacturing process outputs.