Patents Assigned to T. Swan & Co. Limited
  • Chemical vapor deposition
    Patent number: 5871586
    Abstract: Chemical vapor deposition reactions are carried out by introducing first and second precursors for the material to be deposited into a reaction chamber (5) along a plurality of separate discrete paths (21,24) where they are cooled prior to entry into the reaction chamber. The precursors are mixed in the reaction chamber which contains a heated substrate (4) and react to deposit the material on the substrate.
    Type: Grant
    Filed: April 9, 1997
    Date of Patent: February 16, 1999
    Assignee: T. Swan & Co. Limited
    Inventors: John A. Crawley, Victor J. Saywell