Patents Assigned to Tae Hwan Kim
  • Glass etching composition
    Patent number: 5281350
    Abstract: The present invention provides an improved glass etching composition which does not contain any causative materials such as hydrofluoric acid, causing environmental pollution. The etching composition comprises a first solution of a flow modifier and ammonium bifluoride in purified glycerine; and a second solution of ammonium bifluoride and ferric chloride in purified glycerine.
    Type: Grant
    Filed: October 30, 1992
    Date of Patent: January 25, 1994
    Assignee: Tae Hwan Kim
    Inventors: Soon Ho Gimm, Jung Hyang Kim