Patents Assigned to TAE TECHNOLOGIES, INC.
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Patent number: 10807482Abstract: Module-based energy systems are provided having multiple converter-source modules. The converter-source modules can each include an energy source and a converter. The systems can further include control circuitry for the modules. The modules can be arranged in various ways to provide single phase AC, multi-phase AC, and/or DC outputs. Each module can be independently monitored and controlled.Type: GrantFiled: March 27, 2020Date of Patent: October 20, 2020Assignee: TAE TECHNOLOGIES, INC.Inventors: Mikhail Slepchenkov, Roozbeh Naderi
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Patent number: 10807481Abstract: Module-based energy systems are provided having multiple converter-source modules. The converter-source modules can each include an energy source and a converter. The systems can further include control circuitry for the modules. The modules can be arranged in various ways to provide single phase AC, multi-phase AC, and/or DC outputs. Each module can be independently monitored and controlled.Type: GrantFiled: March 27, 2020Date of Patent: October 20, 2020Assignee: TAE TECHNOLOGIES, INC.Inventors: Mikhail Slepchenkov, Roozbeh Naderi
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Patent number: 10790064Abstract: A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber.Type: GrantFiled: August 26, 2019Date of Patent: September 29, 2020Assignee: TAE TECHNOLOGIES, INC.Inventors: Michel Tuszewski, Michl W. Binderbauer, Sergei Putvinski, Artem N. Smirnov
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Patent number: 10743398Abstract: A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet or CT injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber.Type: GrantFiled: August 12, 2019Date of Patent: August 11, 2020Assignee: TAE TECHNOLOGIES, INC.Inventors: Michl W. Binderbauer, Eusebio Garate, Sergei Putvinski, Hiroshi Gota
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Patent number: 10665745Abstract: A magnetically polarized photonic device is provided. The magnetically polarized photonic device (100) includes substrate (102), an annihilation layer (106) and a graded band gap layer (142). The annihilation layer (106) is deposed on a surface (104) of substrate (102) with graded band gap layer (142) disposed on annihilation layer (106). Contacts (116, 128) are disposed on ends (146, 150) of magnetically polarized photonic device (100). A magnetic field (159) is applied to graded band gap layer (142) and annihilation layer (106) to drive charges to contacts (116, 128).Type: GrantFiled: December 13, 2013Date of Patent: May 26, 2020Assignee: TAE TECHNOLOGIES, INC.Inventor: Daniel Scott Marshall
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Patent number: 10665351Abstract: Systems and methods utilizing successive, axially symmetric acceleration and adiabatic compression stages to heat and accelerate two compact tori towards each other and ultimately collide and compress the compact tori within a central chamber. Alternatively, systems and methods utilizing successive, axially asymmetric acceleration and adiabatic compression stages to heat and accelerate a first compact toroid towards and position within a central chamber and to heat and accelerate a second compact toroid towards the central chamber and ultimately collide and merge the first and second compact toroids and compress the compact merge tori within the central chamber.Type: GrantFiled: February 15, 2019Date of Patent: May 26, 2020Assignee: TAE TECHNOLOGIES, INC.Inventors: Michl W. Binderbauer, Vitaly Bystritskii, Toshiki Tajima
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Patent number: 10440806Abstract: A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet or CT injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber.Type: GrantFiled: April 28, 2017Date of Patent: October 8, 2019Assignee: TAE TECHNOLOGIES, INC.Inventors: Michl W. Binderbauer, Eusebio Garate, Sergei Putvinski, Hiroshi Gota
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Patent number: 10438702Abstract: A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber.Type: GrantFiled: July 16, 2018Date of Patent: October 8, 2019Assignee: TAE TECHNOLOGIES, INC.Inventors: Michel Tuszewski, Michl W. Binderbauer, Sergei Putvinski, Artem N. Smirnov
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Patent number: 10418170Abstract: Systems and methods to reduce the amplitude of undesirable eddy currents in conducting structures, e.g., induced by the translation of an FRC into a confinement chamber, while leaving beneficial eddy currents unaffected. This is achieved by inducing opposing currents in the same conducting structures prior to plasma translation into the confinement chamber.Type: GrantFiled: November 9, 2017Date of Patent: September 17, 2019Assignee: TAE TECHNOLOGIES, INC.Inventor: Nikolaus Rath
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Patent number: 10398016Abstract: A negative ion-based beam injector comprising a negative ion source and an accelerator. The ions produced by the ion source are pre-accelerated before injection into a high energy accelerator by an electrostatic multi-aperture grid pre-accelerator, which is used to extract ion beams from the plasma and accelerate to some fraction of the required beam energy. The beam from the ion source passes through a pair of deflecting magnets, which enable the beam to shift off axis before entering the high energy accelerator. The negative ion-based beam injector can be combined with a neutralizer to produce about a 5 MW neutral beam with energy of about 0.50 to 1.0 MeV. After acceleration to full energy, the beam enters the neutralizer where it is partially converted into a neutral beam. The remaining ion species are separated by a magnet and directed into electrostatic energy converters. The neutral beam passes through a gate valve and enters a plasma chamber.Type: GrantFiled: February 27, 2018Date of Patent: August 27, 2019Assignee: TAE TECHNOLOGIES, INC.Inventors: Yuri I. Belchenko, Alexander V. Burdakov, Vladimir I. Davydenko, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets, Artem N. Smirnov, Michl W. Binderbauer, Donald L. Sevier, Terence E. Richardson
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Patent number: 10375814Abstract: A non-resonance photo-neutralizer for negative ion-based neutral beam injectors. The non-resonance photo-neutralizer utilizes a nonresonant photon accumulation, wherein the path of a photon becomes tangled and trapped in a certain space region, i.e., the photon trap. The trap is preferably formed by two smooth mirror surfaces facing each other with at least one of the mirrors being concave. In its simplest form, the trap is elliptical. A confinement region is a region near a family of normals, which are common to both mirror surfaces. The photons with a sufficiently small angle of deviation from the nearest common normal are confined. Depending on specific conditions, the shape of the mirror surface may be one of spherical, elliptical, cylindrical, or toroidal geometry, or a combination thereof.Type: GrantFiled: May 19, 2017Date of Patent: August 6, 2019Assignee: TAE TECHNOLOGIES, INC.Inventors: Alexander V. Burdakov, Alexandr A. Ivanov, Sergey S. Popov
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Patent number: 10217532Abstract: Systems and methods utilizing successive, axially symmetric acceleration and adiabatic compression stages to heat and accelerate two compact tori towards each other and ultimately collide and compress the compact tori within a central chamber. Alternatively, systems and methods utilizing successive, axially asymmetric acceleration and adiabatic compression stages to heat and accelerate a first compact toroid towards and position within a central chamber and to heat and accelerate a second compact toroid towards the central chamber and ultimately collide and merge the first and second compact toroids and compress the compact merge tori within the central chamber.Type: GrantFiled: April 10, 2017Date of Patent: February 26, 2019Assignee: TAE TECHNOLOGIES, INC.Inventors: Michl W. Binderbauer, Vitaly Bystritskii, Toshiki Tajima
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Patent number: 10193298Abstract: A new optically pumped far infrared (FIR) laser with separate pump beam reflector and FIR output coupler is developed. The configuration of the new FIR laser greatly simplifies the tuning of the laser and enables the optimization of the pump beam absorption without affecting the laser alignment.Type: GrantFiled: December 30, 2014Date of Patent: January 29, 2019Assignee: TAE TECHNOLOGIES, INC.Inventor: Bihe Deng
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Patent number: 10049774Abstract: A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber.Type: GrantFiled: March 23, 2016Date of Patent: August 14, 2018Assignee: TAE TECHNOLOGIES, INC.Inventors: Michel Tuszewski, Michl W. Binderbauer, Sergei Putvinski, Artem N. Smirnov
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Patent number: 9924587Abstract: A negative ion-based neutral beam injector comprising a negative ion source, accelerator and neutralizer to produce about a 5 MW neutral beam with energy of about 0.50 to 1.0 MeV. The ions produced by the ion source are pre-accelerated before injection into a high energy accelerator by an electrostatic multi-aperture grid pre-accelerator, which is used to extract ion beams from the plasma and accelerate to some fraction of the required beam energy. The beam from the ion source passes through a pair of deflecting magnets, which enable the beam to shift off axis before entering the high energy accelerator. After acceleration to full energy, the beam enters the neutralizer where it is partially converted into a neutral beam. The remaining ion species are separated by a magnet and directed into electrostatic energy converters. The neutral beam passes through a gate valve and enters a plasma chamber.Type: GrantFiled: January 25, 2017Date of Patent: March 20, 2018Assignee: TAE TECHNOLOGIES, INC.Inventors: Yuri I. Belchenko, Alexander V. Burdakov, Vladimir I. Davydenko, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets, Artem N. Smirnov, Michl W. Binderbauer, Donald L. Sevier, Terence E. Richardson
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Patent number: 9893226Abstract: Systems and methods for the conversion of energy of high-energy photons into electricity which utilize a series of materials with differing atomic charges to take advantage of the emission of a large multiplicity of electrons by a single high-energy photon via a cascade of Auger electron emissions. In one embodiment, a high-energy photon converter preferably includes a linearly layered nanometric-scaled wafer made up of layers of a first material sandwiched between layers of a second material having an atomic charge number differing from the atomic charge number of the first material. In other embodiments, the nanometric-scaled layers are configured in a tubular or shell-like configuration and/or include layers of a third insulator material.Type: GrantFiled: December 28, 2016Date of Patent: February 13, 2018Assignee: TAE TECHNOLOGIES, INC.Inventors: Michl W. Binderbauer, Toshiki Tajima