Patents Assigned to TAE TECHNOLOGIES, INC.
  • Patent number: 10193298
    Abstract: A new optically pumped far infrared (FIR) laser with separate pump beam reflector and FIR output coupler is developed. The configuration of the new FIR laser greatly simplifies the tuning of the laser and enables the optimization of the pump beam absorption without affecting the laser alignment.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: January 29, 2019
    Assignee: TAE TECHNOLOGIES, INC.
    Inventor: Bihe Deng
  • Patent number: 10049774
    Abstract: A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: August 14, 2018
    Assignee: TAE TECHNOLOGIES, INC.
    Inventors: Michel Tuszewski, Michl W. Binderbauer, Sergei Putvinski, Artem N. Smirnov
  • Patent number: 9924587
    Abstract: A negative ion-based neutral beam injector comprising a negative ion source, accelerator and neutralizer to produce about a 5 MW neutral beam with energy of about 0.50 to 1.0 MeV. The ions produced by the ion source are pre-accelerated before injection into a high energy accelerator by an electrostatic multi-aperture grid pre-accelerator, which is used to extract ion beams from the plasma and accelerate to some fraction of the required beam energy. The beam from the ion source passes through a pair of deflecting magnets, which enable the beam to shift off axis before entering the high energy accelerator. After acceleration to full energy, the beam enters the neutralizer where it is partially converted into a neutral beam. The remaining ion species are separated by a magnet and directed into electrostatic energy converters. The neutral beam passes through a gate valve and enters a plasma chamber.
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: March 20, 2018
    Assignee: TAE TECHNOLOGIES, INC.
    Inventors: Yuri I. Belchenko, Alexander V. Burdakov, Vladimir I. Davydenko, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets, Artem N. Smirnov, Michl W. Binderbauer, Donald L. Sevier, Terence E. Richardson
  • Patent number: 9893226
    Abstract: Systems and methods for the conversion of energy of high-energy photons into electricity which utilize a series of materials with differing atomic charges to take advantage of the emission of a large multiplicity of electrons by a single high-energy photon via a cascade of Auger electron emissions. In one embodiment, a high-energy photon converter preferably includes a linearly layered nanometric-scaled wafer made up of layers of a first material sandwiched between layers of a second material having an atomic charge number differing from the atomic charge number of the first material. In other embodiments, the nanometric-scaled layers are configured in a tubular or shell-like configuration and/or include layers of a third insulator material.
    Type: Grant
    Filed: December 28, 2016
    Date of Patent: February 13, 2018
    Assignee: TAE TECHNOLOGIES, INC.
    Inventors: Michl W. Binderbauer, Toshiki Tajima