Patents Assigned to TAIWAN CHINA COMPANY, LIMITED
  • Patent number: 12009388
    Abstract: A method includes forming a dielectric layer on a substrate; forming a first spiral electrode, a second spiral electrode, and a spiral common electrode in the dielectric layer, the first spiral electrode extending in a first spiral path, the second spiral electrode extending in a second spiral path, and the spiral common electrode extending in a third spiral path laterally between the first and second spiral paths.
    Type: Grant
    Filed: October 28, 2022
    Date of Patent: June 11, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC CHINA COMPANY LIMITED
    Inventor: Zheng-Long Chen
  • Patent number: 12002507
    Abstract: A device is provided. The device includes multiple transistors, a first sense circuit, and a precharge circuit. The transistors are coupled to a tracking bit line and configured to generate a first tracking signal. The first sense circuit is configured to generate a first sense tracking signal in response to the first tracking signal. The precharge circuit is configured to generate, in response to a rising edge and a falling edge of the first sense tracking signal, a precharge signal for precharging data lines.
    Type: Grant
    Filed: December 20, 2022
    Date of Patent: June 4, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li Yang, He-Zhou Wan, Lu-Ping Kong, Wei-Yang Jiang
  • Publication number: 20240178215
    Abstract: An integrated circuit includes a first transistor, a second transistor, a first power line, and a second power line. The first transistor has a first active region and a first gate structure, in which the first active region has a source region and a drain region on opposite sides of the first gate structure. The second transistor is below the first transistor, and has a second active region and a second gate structure, in which the second active region has a source region and a drain region on opposite sides of the second gate structure. The first power line is above the first transistor, in which the first power line is electrically connected to the source region of first active region. The second power line is below the second transistor, in which the second power line is electrically connected to the source region of second active region.
    Type: Application
    Filed: February 5, 2024
    Publication date: May 30, 2024
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC China Company Limited
    Inventors: Xin-Yong WANG, Li-Chun TIEN, Chih-Liang CHEN
  • Patent number: 11978797
    Abstract: A semiconductor device includes a gate structure, a drift region, a source region, a drain region, and a doped region. The gate structure is over a semiconductor substrate. The drift region is in the semiconductor substrate and laterally extends past a first side of the gate structure. The source region is in the semiconductor substrate and adjacent a second side of the gate structure opposite the first side. The drain region is in the drift region. The doped region is in the drift region and between the drain region and the gate structure. From a top view the doped region has a strip pattern extending in parallel with a strip pattern of the gate structure.
    Type: Grant
    Filed: August 9, 2022
    Date of Patent: May 7, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC CHINA COMPANY LIMITED
    Inventors: Lian-Jie Li, Yan-Bin Lu, Feng Han, Shuai Zhang
  • Patent number: 11929361
    Abstract: An integrated circuit includes a first transistor, a second transistor, a first power line, and a second power line. The first transistor has a first active region and a first gate structure, in which the first active region has a source region and a drain region on opposite sides of the first gate structure. The second transistor is below the first transistor, and has a second active region and a second gate structure, in which the second active region has a source region and a drain region on opposite sides of the second gate structure. The first power line is above the first transistor, in which the first power line is electrically connected to the source region of first active region. The second power line is below the second transistor, in which the second power line is electrically connected to the source region of second active region.
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: March 12, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC CHINA COMPANY LIMITED
    Inventors: Xin-Yong Wang, Li-Chun Tien, Chih-Liang Chen
  • Patent number: 11923041
    Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.
    Type: Grant
    Filed: July 5, 2022
    Date of Patent: March 5, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li Yang, He-Zhou Wan, Mu-Yang Ye, Lu-Ping Kong, Ming-Hung Chang
  • Patent number: 11695413
    Abstract: A Schmitt trigger circuit includes a first and second set of transistors, a first and second feedback transistor, and a first and second circuit. The first set of transistors is connected between a first voltage supply and an output node. The first voltage supply has a first voltage. The second set of transistors is connected between the output node and a second voltage supply. The second voltage supply has a second voltage. The first feedback transistor is connected to the output node, a first node and a second node. The second feedback transistor is connected to the output node, a third node and a fourth node. The first circuit is coupled to and configured to supply the second supply voltage to the second node. The second circuit is coupled to and configured to supply the first supply voltage to the fourth node.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: July 4, 2023
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TAIWAN CHINA COMPANY, LIMITED, TSMC NANJING COMPANY, LIMITED
    Inventors: Lei Pan, Yaqi Ma, Jing Ding, Zhang-Ying Yan