Patents Assigned to Taiyo Ink (Suzhou) Co., Ltd.
  • Publication number: 20150079505
    Abstract: Provided is an alkaline developable photosensitive resin composition which does not contain crude particles, has excellent storage stability, can avoid the deterioration of working environments, and contains few substances toxic to human bodies. The alkaline developable photosensitive resin composition is characterized by comprising (A) a resin containing a carboxyl group, (B) a photopolymerization initiator, (C) a compound having at least two ethylenically unsaturated groups per molecule, and (D) a dibasic acid ester.
    Type: Application
    Filed: August 15, 2012
    Publication date: March 19, 2015
    Applicant: TAIYO INK(SUZHOU) CO., LTD.
    Inventor: Kenji Kato
  • Publication number: 20150037588
    Abstract: Provided is a photosensitive resin composition which has excellent heat resistance, pore explosion resistance, empty foam resistance and crack resistance. A photosensitive resin composition of the present invention contains (A) a carboxyl group-containing resin, (B) a photopolymerization initiator, (C) a diluent solvent, (D) a compound that has two or more ethylenically unsaturated groups in each molecule and (E) a thermosetting component that has two or more cyclic ether groups and/or cyclic thioether groups in each molecule.
    Type: Application
    Filed: August 15, 2012
    Publication date: February 5, 2015
    Applicant: TAIYO INK (SUZHOU) CO., LTD.
    Inventor: Kenji Kato
  • Patent number: 8932798
    Abstract: Provided is an alkali-developable photosensitive resin composition, the dry coating film of which has a favorable dryness to touch, excellent storage stability and few substances that are harmful to humans. The alkali-developable resin composition comprising (A) a carboxyl group-containing resin, (B) a photopolymerization initiator, (C) a compound with two or more ethylenic unsaturated groups in the molecule, (D) filler and (E) an aromatic petroleum solvent, is characterized in that the naphthalene content of said composition is 300 ppm or less.
    Type: Grant
    Filed: September 13, 2010
    Date of Patent: January 13, 2015
    Assignee: Taiyo Ink (Suzhou) Co., Ltd.
    Inventor: Kenji Kato
  • Publication number: 20130122420
    Abstract: Provided is an alkali-developable photosensitive resin composition, the dry coating film of which has a favorable dryness to touch, excellent storage stability and few substances that are harmful to humans. The alkali-developable resin composition comprising (A) a carboxyl group-containing resin, (B) a photopolymerization initiator, (C) a compound with two or more ethylenic unsaturated groups in the molecule, (D) filler and (E) an aromatic petroleum solvent, is characterized in that the naphthalene content of said composition is 300 ppm or less.
    Type: Application
    Filed: September 13, 2010
    Publication date: May 16, 2013
    Applicant: Taiyo Ink (Suzhou) Co., Ltd.
    Inventor: Kenji Kato