Abstract: This disclosure provides a vapor-liquid reaction device including a vapor-liquid reaction chamber and a projecting member. The vapor-liquid reaction chamber holds a molten metal in a lower portion of an internal space of the vapor-liquid reaction chamber.
Type:
Grant
Filed:
May 17, 2018
Date of Patent:
November 15, 2022
Assignees:
National University Corporation Tokyo University of Agriculture and Technology, Taiyo Nippon Sanso Corporation, Taiyo Nippon Sanso CSE Corporation
Abstract: This disclosure provides a vapor-liquid reaction device including a vapor-liquid reaction chamber and a projecting member. The vapor-liquid reaction chamber holds a molten metal in a lower portion of an internal space of the vapor-liquid reaction chamber.
Type:
Application
Filed:
May 17, 2018
Publication date:
March 5, 2020
Applicants:
National University Corporation Tokyo University of Agriculture and Technology, Taiyo Nippon Sanso Corporation, Taiyo Nippon Sanso CSE Corporation