Patents Assigned to Taiyo Toyo Sanso Co., Ltd.
  • Patent number: 6221323
    Abstract: Super clean air having therein chemical components—such as hydrocarbons, organic halogens, acidic gases, basic gases, aldehydes, nitrogen oxides, and H2O (that is, all components other than oxygen, nitrogen, and noble gases—the types of chemical components differ depending on the source of the air)—in concentrations no more than 1 ppb and a dew point lower than −40° C., is obtained from the atmosphere by low-temperature adsorption treatment in stages at temperatures ranging from −40° C. to −180° C. Material air collected from the atmosphere is pretreated in a room-temperature adsorption step to remove moisture and carbon dioxide. The pretreated air is then low-temperature adsorption treated by absorbents in a plurality of steps to adsorb the gaseous chemical components, the treatment temperature being lower in each succeeding step. Treatment at −40° C. may remove, for example, HF, SO2, and/or NH3. Treatment at −100° C.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: April 24, 2001
    Assignees: Taiyo Toyo Sanso Co., Ltd., Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masashi Mizuno, Masuo Tada, Norio Yamazaki, Takaaki Fukumoto
  • Patent number: 6189368
    Abstract: Real-time and accurate detection of the concentration of hydrogen peroxide vapor supplied into a treatment vessel is made possible by a method and apparatus that permits efficient and effective sterilization, disinfection, or the like with hydrogen peroxide vapor. The concentration of hydrogen peroxide vapor in a treatment vessel is detected by a semiconductor gas sensor in a treatment system where an object to be treated is brought into contact with hydrogen peroxide vapor in a treatment vessel with the pressure fixed at a constant level.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: February 20, 2001
    Assignee: Taiyo Toyo Sanso Co., Ltd.
    Inventors: Taizo Ichida, Shinichi Ando, Akihide Terao
  • Patent number: 6151914
    Abstract: Super clean air suitable for use in a tunnel-type wafer transport system, etc., is produced efficiently with the specific energy consumption reduced and the yield improved by making good use of part of cooling energy and gas produced in a low temperature separation type nitrogen producing apparatus. Material air 1a collected from the atmosphere is pretreated in a room temperature adsorption tower 7, this pretreated air is adsorption treated at -60.degree. C. in a first low temperature adsorption tower 9, and the treated air 1c is further adsorption treated at -150.degree. C. in a second low temperature adsorption tower 10, thereby producing super clean air 1e containing not higher than 1 ppb of the chemical components other than nitrogen, oxygen and noble gases and having a dew point of not higher than -100.degree. C.
    Type: Grant
    Filed: September 14, 1998
    Date of Patent: November 28, 2000
    Assignees: Taiyo Toyo Sanso Co., Ltd., Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masashi Mizuno, Masuo Tada, Norio Yamazaki, Toshiaki Ohmori
  • Patent number: 5918817
    Abstract: A two-fluid cleaning jet nozzle has an atomizing unit provided with an atomizing tube in which a liquid is atomized by a pressurized gas into liquid droplets, and an accelerating unit provided with an accelerating tube which accelerates and jets the liquid droplets against the surface of a workpiece to remove dust particles adhering to the surface of the workpiece. The sectional area of the atomizing tube available for gas flow is greater than the sectional area of the accelerating tube available for flow of the gas and the liquid droplets. The accelerating tube has the shape of a straight cylindrical tube or a Laval nozzle.
    Type: Grant
    Filed: July 11, 1997
    Date of Patent: July 6, 1999
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Taiyo Toyo Sanso Co., Ltd.
    Inventors: Itaru Kanno, Masuo Tada, Mitsuhiro Ogawa
  • Patent number: 5608156
    Abstract: The disclosure where the hydrogen peroxide vapor 4a is supplied to a treatment vessel, and a subject 1 to be treated in the treatment vessel 2 is subjected to a sterilization treatment by contact with the hydrogen peroxide vapor 4a, the concentration of the hydrogen peroxide vapor 4a in the treatment vessel 2 is detected directly and accurately on a real-time basis by a semiconductor gas sensor 8.
    Type: Grant
    Filed: June 23, 1995
    Date of Patent: March 4, 1997
    Assignee: Taiyo Toyo Sanso Co., Ltd.
    Inventors: Shinichi Ando, Taizo Ichida