Abstract: Expansion compensating structures are formed in redistribution layers of a wafer-level chip-scale integrated circuit package (WLCSP) or other IC package having a low-expansion substrate. The structures include micromechanical actuators designed and oriented to move solder bumps attached to them in the same direction and distance as a function of temperature as do pads to which they may be connected on a higher-expansion substrate such as a printed circuit board. Expansion compensated IC packages incorporating these expansion compensating structures are provided, as well as expansion compensated assemblies containing one or more of these IC packages. Methods of fabricating expansion compensated IC packages requiring minimal changes to existing commercial WLCSP fabrication processes are also provided. These devices and methods will result in assemblies having improved board-level reliability during thermal cycling, and allow the use of larger IC die sizes in WLCSP technology.

Abstract: CMOS output stages, electrostatic discharge (ESD) protection circuits and input bus-keeper functions are provided that block dc and ac leakage paths within inactive powered-down integrated circuits used in redundant high-reliability system configurations employing cold-sparing to provide backup circuitry. These circuits and methods avoid both undesirable power consumption in a cold-spared backup unit and loading of connected active units when powered down, without compromising performance or functionality of the backup unit when in its active powered state. Inputs and outputs using an analog majority voting principle to implement in-circuit redundancy for on-chip fault tolerance are also provided, incorporating the low-leakage principles of the invention for low power dissipation when powered down. Such on-chip redundancy can harden an IC against various faults, such as single-event effects in high-radiation environments, while maintaining the other advantages in a cold-sparing system.

Abstract: Designs for radiation hardening CMOS devices and integrated circuits using shallow trench isolation (STI) improve total ionizing dose (TID) radiation response by reducing the leakage currents from source to drain associated with corners and sidewalls of trench insulator edges passing under the gate in an NMOS device while maintaining high breakdown voltage. A silicide block pattern is used in combination with pullback of N+ source and drain regions from at least a portion of these edges of the active region. Additional p-type implants along these edges further increase parasitic threshold voltages and enhance radiation hardness. A process for fabricating devices and integrated circuits incorporating these features is also provided. These techniques and processes are applied to exemplary low-voltage NMOS transistors having straight gates and to high-voltage annular-gate devices, as well as to device-to-device isolation in integrated circuits.

Abstract: Designs for radiation hardening CMOS devices and integrated circuits using shallow trench isolation (STI) improve total ionizing dose (TID) radiation response by reducing the leakage currents from source to drain associated with corners and sidewalls of trench insulator edges passing under the gate in an NMOS device while maintaining high breakdown voltage. A silicide block pattern is used in combination with pullback of N+ source and drain regions from at least a portion of these edges of the active region. Additional p-type implants along these edges further increase parasitic threshold voltages and enhance radiation hardness. A process for fabricating devices and integrated circuits incorporating these features is also provided. These techniques and processes are applied to exemplary low-voltage NMOS transistors having straight gates and to high-voltage annular-gate devices, as well as to device-to-device isolation in integrated circuits.