Patents Assigned to Tech Met, Inc.
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Patent number: 11952523Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.Type: GrantFiled: September 28, 2021Date of Patent: April 9, 2024Assignee: Tech Met, Inc.Inventors: Michael Vidra, Edward Palanko, Robert Vaccaro, Jordan Incerpi
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Patent number: 11952669Abstract: Compositions and methods for etching a nanoscale geometry on a metal or metal alloy surface are disclosed. Such surfaces, when included on an implantable medical device, enhance healing after surgery. When included on a bone contacting medical implant, the nanoscale geometry may enhance osseointegration. When included on a tissue contacting device, the nanoscale geometry may enhance endothelial cell attachment, proliferation, and restoration of a healthy endothelial surface.Type: GrantFiled: November 12, 2021Date of Patent: April 9, 2024Assignee: Tech Met, Inc.Inventors: Michael Vidra, Daniel Jon Schutzer, Jordan Incerpi
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Patent number: 11932947Abstract: Compositions and methods for etching an implantable device having a cobalt chrome surface are disclosed. The compositions generally include at least two mineral acids, iron (Fe), and certain component metals of the cobalt chrome to be etched. For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with improved osseointegration, biocompatibility, and healing after surgery.Type: GrantFiled: August 28, 2020Date of Patent: March 19, 2024Assignee: Tech Met, Inc.Inventors: Michael Vidra, Jordan Incerpi, Daniel Jon Schutzer
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Patent number: 11851772Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.Type: GrantFiled: May 13, 2020Date of Patent: December 26, 2023Assignee: Tech Met, Inc.Inventors: Michael Vidra, Edward Palanko, Robert Vaccaro, Jordan Incerpi
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Patent number: 11682550Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.Type: GrantFiled: February 11, 2020Date of Patent: June 20, 2023Assignee: Tech Met, Inc.Inventors: Michael Vidra, Robert Vaccaro, Edward Palanko, Mark Megela
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Publication number: 20220017822Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.Type: ApplicationFiled: September 28, 2021Publication date: January 20, 2022Applicant: Tech Met, Inc.Inventors: Michael Vidra, Edward Palanko, Robert Vaccaro, Jordan Incerpi
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Publication number: 20210332483Abstract: Compositions and methods for etching cobalt chromium alloys are disclosed. The compositions generally include at least two mineral acids, certain component metals of the alloy to be etched, and optionally iron (Fe). For example, when etching a cobalt chromium molybdenum alloy, the component metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). The methods provide for etching an entire surface of a substrate or etching a surface of a substrate in a pattern using selective coating patterns and/or coating removal. Thus, unlimited patterns, as well as etch depths and variations in etch depths are achievable using the compositions and methods disclosed. Moreover, the compositions and methods provide cobalt chrome surfaces having very low surface roughness (Ra) that are useful in the aerospace industry.Type: ApplicationFiled: July 2, 2021Publication date: October 28, 2021Applicant: Tech Met, Inc.Inventors: Michael VIDRA, Daniel Schutzer
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Patent number: 11053595Abstract: Compositions and methods for etching cobalt chromium alloys are disclosed. The compositions generally include at least two mineral acids, certain component metals of the alloy to be etched, and optionally iron (Fe). For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). The methods provide for etching an entire surface of a substrate or etching a surface of a substrate in a pattern using selective coating patterns and/or coating removal. Thus, unlimited patterns, as well as etch depths and variations in etch depths are achievable using the compositions and methods disclosed.Type: GrantFiled: December 16, 2019Date of Patent: July 6, 2021Assignee: Tech Met, Inc.Inventors: Michael Vidra, Daniel Jon Schutzer
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Publication number: 20210062347Abstract: Compositions and methods for etching an implantable device having a cobalt chrome surface are disclosed. The compositions generally include at least two mineral acids, iron (Fe), and certain component metals of the cobalt chrome to be etched. For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with improved osseointegration, biocompatibility, and healing after surgery.Type: ApplicationFiled: August 28, 2020Publication date: March 4, 2021Applicant: TECH MET, INC.Inventors: Michael Vidra, Jordan Incerpi, Daniel Jon Schutzer
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Publication number: 20200362466Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.Type: ApplicationFiled: May 13, 2020Publication date: November 19, 2020Applicant: TECH MET, INC.Inventors: Michael Vidra, Edward Palanko, Robert Vaccaro, Jordan Incerpi
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Publication number: 20200190671Abstract: Compositions and methods for etching cobalt chromium alloys are disclosed. The compositions generally include at least two mineral acids, certain component metals of the alloy to be etched, and optionally iron (Fe). For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). The methods provide for etching an entire surface of a substrate or etching a surface of a substrate in a pattern using selective coating patterns and/or coating removal. Thus, unlimited patterns, as well as etch depths and variations in etch depths are achievable using the compositions and methods disclosed.Type: ApplicationFiled: December 16, 2019Publication date: June 18, 2020Applicant: Tech Met, Inc.Inventors: Michael VIDRA, Daniel Jon SCHUTZER
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Publication number: 20200176243Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.Type: ApplicationFiled: February 11, 2020Publication date: June 4, 2020Applicant: Tech Met, Inc.Inventors: Michael Vidra, Robert Vaccaro, Edward Palanko, Mark Megela
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Patent number: 10399240Abstract: Methods and devices for etching patterns on interior surfaces of hollow objects are described. The method may include preparation of the interior surface of the object, such as pre-cleaning, and coating the interior surface of the object. A pattern may then be generated on the interior surface of the object by any of mechanical or manual scribing and peeling, laser ablation, or photoresist coating and laser exposure, development and hardening. The pattern is then etched using chemical etchants, and finished to remove remaining coating, provide surface passivation and/or protectant application. Mechanical and laser devices which may facilitate pattern generation are also described.Type: GrantFiled: March 13, 2017Date of Patent: September 3, 2019Assignee: Tech Met, Inc.Inventors: Michael Vidra, James Ringer, Robert Vaccaro, Mark Megela, Edward Palanko
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Publication number: 20190051514Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.Type: ApplicationFiled: October 18, 2018Publication date: February 14, 2019Applicant: Tech Met, Inc.Inventors: Michael Vidra, Robert Vaccaro, Edward Palanko, Mark Megela
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Publication number: 20170259444Abstract: Methods and devices for etching patterns on interior surfaces of hollow objects are described. The method may include preparation of the interior surface of the object, such as pre-cleaning, and coating the interior surface of the object. A pattern may then be generated on the interior surface of the object by any of mechanical or manual scribing and peeling, laser ablation, or photoresist coating and laser exposure, development and hardening. The pattern is then etched using chemical etchants, and finished to remove remaining coating, provide surface passivation and/or protectant application. Mechanical and laser devices which may facilitate pattern generation are also described.Type: ApplicationFiled: March 13, 2017Publication date: September 14, 2017Applicant: Tech Met, Inc.Inventors: Michael Vidra, James Ringer, Robert Vaccaro, Mark Megela, Edward Palanko
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Patent number: 6193762Abstract: An attachment surface for an implantable device has a random irregular pattern formed through a repetitive masking and chemical milling process. Additionally, an attachment surface for an implantable device has a random irregular pattern formed through a repetitive masking and electrochemical milling process. The electrochemical milling process is particularly well suited for use with substrate materials which have high chemical inertness which makes them resistant to chemical etching. Surface material is removed from the implant surface without stress on the adjoining material and the process provides fully dimensional fillet radii at the base of the surface irregularities. This irregular surface is adapted to receive the ingrowth of bone material and to provide a strong anchor for that bone material. The unitary nature of the substrate and surface features provides a strong anchoring surface with is resistant to cracking or breaking.Type: GrantFiled: June 2, 1999Date of Patent: February 27, 2001Assignees: Cycam, Inc., Tech Met, Inc.Inventors: Donald J. Wagner, Gary Reed
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Patent number: 5507815Abstract: An attachment surface for an implantable device has a random irregular pattern formed through a repetitive masking and chemical milling process. Surface material is removed from the implant surface without stress on the adjoining material and the process provides fully dimensional fillet radii at the base of the surface irregularities. This irregular surface is adapted to receive the ingrowth of bone material and to provide a strong anchor for that bone material. The unitary nature of the substrate and surface features provides a strong anchoring surface with is resistant to cracking or breaking. The surface is prepared through an etching process which utilizes the random application of a maskant and subsequent etching of the metallic substrate in areas unprotected by the maskant. This chemical etching process is repeated a number of times as necessitated by the nature of the irregularities required in the surface.Type: GrantFiled: December 15, 1994Date of Patent: April 16, 1996Assignees: Cycam, Inc., Tech Met, Inc.Inventors: Donald J. Wagner, Gary Reed
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Patent number: 5258098Abstract: An attachment surface for increasing adhesion between two objects or materials and a method for creating such a surface is disclosed. A substrate, including articles such as particularly an implantable device and high performance aircraft parts, is provided with a random irregular pattern formed through a repetitive masking and chemical milling process. Surface material is removed from the substrate without stress on the adjoining material and the process provides fully dimensional fillet radii at the base of the surface irregularities. This irregular surface is adapted to receive the adjacent material to be joined thereto, such as the ingrowth of bone material, and to provide a strong anchor for that material. The unitary nature of the substrate and surface features provides a strong anchoring surface with is resistant to cracking or breaking.Type: GrantFiled: September 6, 1991Date of Patent: November 2, 1993Assignees: Cycam, Inc., Tech Met, Inc.Inventors: Donald J. Wagner, Gary Reed