Abstract: A transparent product can reliably transmit management information, and even under a harsh environment, the indicated management information will not be peeled off. The transparent product includes management information for managing the product. The management information is provided inside the product so that the management information can be visually recognized through at least one surface of the product in the thickness direction.

Abstract: The invention provides a transparent product to which management information is provided such that said management information can be reliably transmitted, which is devised such that even though the product is used under a harsh environment, the indicated management information will be not peeled off, and a production method for the transparent product. The invention provides a transparent product provided with management information and indicating the management information for managing the product, characterized in that said management information is provided at a site where the product has a thickness, and inside thereof in the thickness direction, in which said management information can be visually recognized through at least one of the surfaces of said product in the thickness direction.

Abstract: A method is provided of refurbishing a quartz glass component which has been contaminated and eroded due to continuous use in a plasma process apparatus for semiconductor manufacturing. In the method, a surface deposit on the quartz glass component is removed by an appropriate cleaning method which is determined depending on the contamination status, and presence or absence of residual deposit on the cleaned component is carefully inspected through irradiating with light of a predetermined wavelength to cause fluorescence effect. Then the eroded portion of the quartz glass component is restored to the original state by flame treatment and precision machining. As a result, the refurbishment method can increase the mechanical strength of the quartz glass component, enhance the productivity and yield ratio through efficient use of the remaining materials of the quartz glass.

Abstract: A method is provided of refurbishing a quartz glass component which has been contaminated and eroded due to continuous use in a plasma process apparatus for semiconductor manufacturing. In the method, a surface deposit on the quartz glass component is removed by an appropriate cleaning method which is determined depending on the contamination status, and presence or absence of residual deposit on the cleaned component is carefully inspected through irradiating with light of a predetermined wavelength to cause fluorescence effect. Then the eroded portion of the quartz glass component is restored to the original state by flame treatment and precision machining. As a result, the refurbishment method can increase the mechanical strength of the quartz glass component, enhance the productivity and yield ratio through efficient use of the remaining materials of the quartz glass.