Patents Assigned to Technomex Development, Ltd.
  • Decontamination method for semiconductor wafer handling equipment
    Patent number: 4560417
    Abstract: Semiconductor wafer handling equipment is cleaned and rinsed in a sealed first chamber. Thereafter, the first chamber is unsealed and the handling equipment is moved into a second chamber so that only the handling equipment is introduced into the second chamber. The second chamber is then sealed and the handling equipment is dried therein and thereafter subjected to a stream of ionized gas to eliminate static charge therefrom.
    Type: Grant
    Filed: February 27, 1984
    Date of Patent: December 24, 1985
    Assignee: Technomex Development, Ltd.
    Inventors: Juan Bardina, Mikel Gonzalez