Abstract: Installation for vacuum treatment, particularly of substrates, includes several identical independent and aligned modules. Each module is provided with a vacuum treatment chamber and a transfer chamber having a mechanism for transferring a substrate within one of the different chambers or from one chamber to another, the second chamber being located downstream or upstream from, directly next to, or separated by at least one module from the first chamber. A substrate can be transferred into one chamber in order to undergo a treatment while another substrate is placed in a different chamber for a specific treatment.

Abstract: A vacuum sputtering cathode includes a target support having a cooler. The cathode includes a support base on which a frame is disposed. The frame defines at least one cavity for the circulation of a coolant. A membrane is disposed on top of the frame and the base, frame and membrane are assembled at the periphery of the target.

Abstract: A cathode for a vacuum sputtering processing machine includes a target plate mounted on a support having a cooler. The support is secured to a frame delimiting a closed space for positioning and centering the target. The frame peripherally has a profiled catching rim configured to collaborate with a set of independent gripping elements having complementary catching shapes configured to allow an effect of tilting of the elements resulting from a clamping action exerted on members engaged in a thickness of the elements, and bearing against a part of the catching rim of the frame, so that, under the tilting effect, a part of the catching shapes of the set of gripping elements bears facially against a peripheral edge of the target plate to secure the target plate.

Abstract: A device (1) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized (2) and associated with a magnetic circuit (3) producing a magnetic field (4) which is uniformly divergent, whereby the intensity on the surface of the electrode is more than approximately 6.102 Tesla, the electrode being positioned in the region where the magnetic field is at its most intense.

Abstract: A vacuum sputtering cathode includes a target support having a cooler. The cathode includes a support base on which a frame is disposed. The frame defines at least one cavity for the circulation of a coolant. A membrane is disposed on top of the frame and the base, frame and membrane are assembled at the periphery of the target.

Abstract: Installation for vacuum treatment, particularly of substrates, includes several identical independent and aligned modules. Each module is provided with a vacuum treatment chamber and a transfer chamber having a mechanism for transferring a substrate within one of the different chambers or from one chamber to another, the second chamber being located downstream or upstream from, directly next to, or separated by at least one module from the first chamber. A substrate can be transferred into one chamber in order to undergo a treatment while another substrate is placed in a different chamber for a specific treatment.

Abstract: A surface coating on an insulative material substrate, assuring protection against electromagnetic interference in corrosive environments, comprises two stacked metallic layers. The first layer, in contact with the substrate, is a layer of nickel-based alloy containing about 2% to 20% by weight of an element from group V B from the Periodic Table of the Elements. The second, surface layer is a layer of silver or one or its alloys. Applications include insulative material cases for electrical or electronic components including a shield consisting of a surface coating of this kind.

Abstract: There is disclosed a titanium nitride doped with boron crystallizing with the same structure as titanium nitride TiN and having a Vickers microhardness greater than approximately 50 GPa. There is also disclosed an anti-wear coating comprising this titanium nitride doped with boron. There are also disclosed parts such as metal parts, tungsten carbide parts and cermet parts, for example, including a coating of this type.

Abstract: In a method for harvesting fruits, berries and the like by means of shaker members and in particular for gathering grapes in whole bunches, the shaker members are subjected to a succession of motion stages comprising a high-speed stage, a practically zero speed stage at least at one end of travel of the shaker members and an intermediate stage having a high speed gradient. The speed in the high-speed stage is at least 2 m/s, the time-duration of the practically zero speed stage is at least 30 ms and the speed gradient in the intermediate stage is at least 200 m/s.sup.2.