Patents Assigned to Tecvac Limited
  • Patent number: 8728252
    Abstract: A process for treating a non-ferrous metal component, comprising placing the component into a process chamber at an elevated temperature, biasing the component to have a potential capable of attracting ions, introducing oxygen into the chamber at a pressure such that a glow discharge comprising oxygen ions is generated, the process chamber additionally comprising a glow discharge ionization enhancing means, and activating the glow discharge ionization enhancing means thereby increasing charged species density of the glow discharge, the oxygen ions flowing towards the component and colliding the surface thereof at least some of which diffuse into the component.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: May 20, 2014
    Assignees: Tecvac Limited, The University of Sheffield
    Inventors: Junia Cristina Avelar Batista Wilson, Elliott Ashley Fielding Spain, Jonathan Housden, Allan Matthews, Adrian Leyland
  • Patent number: 4942304
    Abstract: A moveable ion source is provided in apparatus for ion implantation to enable ions to be directed from different directions onto bulky target objects. The ion source may be connected on the outside of a vacuum chamber or on a mobile arm within it.The ion source is supplied with both gas and electricity via a single cable. The supply cable has a multi-layered structure with gas flow being supported through a relatively thin inner tube which also carries the h.t. transmission and return conductors. A relatively thick tube is provided around the inner tube to insulate the transmission and return conductors from an earth conductor and to provide mechanical strength. A special coupling is used to interconnect the supply cable with the ion source housing.
    Type: Grant
    Filed: May 24, 1988
    Date of Patent: July 17, 1990
    Assignee: Tecvac Limited
    Inventor: Malcolm E. Boston