Patents Assigned to TERATECH CO., LTD.
  • Patent number: 9162179
    Abstract: The present invention relates to an apparatus for decomposing perfluorocarbons and harmful gas using a high-density confined plasma source that includes: a reactor having inlet and outlet ports formed in the top and bottom sides thereof for receiving and discharging perfluorocarbons and harmful gas, a chamber having an internal passage, a ferrite core formed outside of the chamber and connected to an antenna, and a permanent magnet arranged around the ferrite core; a gas supply portion for supplying a gas for decomposing the perfluorocarbons and harmful gas into the reactor; and a generator and a controller for supplying electric power for the antenna of the reactor.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: October 20, 2015
    Assignee: TERATECH CO., LTD.
    Inventors: Jin Hong, Gi-Chung Kwon
  • Publication number: 20150196873
    Abstract: The present invention relates to an apparatus for decomposing perfluorocarbons and harmful gas using a high-density confined plasma source that includes: a reactor having inlet and outlet ports formed in the top and bottom sides thereof for receiving and discharging perfluorocarbons and harmful gas, a chamber having an internal passage, a ferrite core formed outside of the chamber and connected to an antenna, and a permanent magnet arranged around the ferrite core; a gas supply portion for supplying a gas for decomposing the perfluorocarbons and harmful gas into the reactor; and a generator and a controller for supplying electric power for the antenna of the reactor.
    Type: Application
    Filed: February 26, 2014
    Publication date: July 16, 2015
    Applicant: TERATECH CO., LTD.
    Inventors: Jin Hong, Gi-Chung Kwon
  • Publication number: 20070286766
    Abstract: Disclosed is an apparatus for cleaning an exhaust line of reaction chambers. The apparatus comprises plasma chambers into which a fluorine or chlorine gas is induced from a gas supply unit as a source of fluorine or chlorine radicals for removing solid deposits in the exhaust line, and a plasma source supply mechanism to convert the fluorine or chlorine gas into the fluorine or chlorine radicals through application of power to the fluorine or chlorine gas. The plasma source supply mechanism comprises an RF generator, antennas surrounding the plasma chamber to convert the fluorine or chlorine gas into the fluorine or chlorine radicals after receiving RF power, a relay switch for selection of RF supply to connect the RF generator with the plasma chambers, and a controller to control the RF power. The radicals are supplied to the exhaust line, and serve to remove the solid deposits.
    Type: Application
    Filed: November 8, 2006
    Publication date: December 13, 2007
    Applicant: TERATECH CO., LTD.
    Inventor: Byoung-Chun Choi