Patents Assigned to Tes Co., Ltd.
  • Patent number: 8138444
    Abstract: Provided is a plasma processing apparatus including a chamber, a lower electrode, an upper electrode, and a substrate sensor. The chamber is configured to provide a reaction space. The lower electrode is disposed at a lower region in the chamber to mount a substrate thereon. The upper electrode is disposed at an upper region in the chamber to be opposite to the lower electrode. The substrate sensor is provided on the chamber to sense the substrate. Herein, the upper electrode includes an electrode plate and an insulating plate attached on the bottom of the electrode plate, and at least one guide hole is formed in the upper electrode to guide light output from the substrate sensor toward the substrate.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: March 20, 2012
    Assignee: Tes Co., Ltd.
    Inventor: Sung Ryul Kim
  • Patent number: 8129912
    Abstract: Provided are an electrode device and an apparatus for generating plasma.
    Type: Grant
    Filed: January 22, 2010
    Date of Patent: March 6, 2012
    Assignee: Tes Co., Ltd.
    Inventors: Hee-Jin Ko, Woo-Young Chung