Patents Assigned to Texas Instruments Incorpated - Justia Patents Search

Patents Assigned to Texas Instruments Incorpated

Reduction in well implant channeling and resulting latchup characteristics in shallow trench isolation by implanting wells through nitride

Patent number: 6617217

Abstract: Retrograde wells are formed by implanting through nitride films (40). Nitride films (40) are formed after STI (20) formation. By selectively masking a portion of the wafer with photoresist (47) after portions of a retrograde well are formed (45, 50, 55, and 60) the channeling of the subsequent zero degree implants is reduced.

Type: Grant

Filed: September 28, 2001

Date of Patent: September 9, 2003

Assignee: Texas Instruments Incorpated

Inventors: Mahalingam Nandakumar, Dixit Kapila, Seetharaman Sridhar