Patents Assigned to The Cyclotron Corporation
  • Method for pumping impurities, especially noble gases, from hydrogen or mixtures of hydrogen and its isotopes
    Patent number: 4328079
    Abstract: A method and apparatus which uses sputter cathode material in an ion sputter pump to discriminate between hydrogen or its isotopes and the pumped impurities by virtue of their different permeability or diffusion rates through and solubility in a film of sputtered cathode material. Iron and specific hydride-forming cathode materials are examples.
    Type: Grant
    Filed: May 2, 1980
    Date of Patent: May 4, 1982
    Assignee: The Cyclotron Corporation
    Inventor: Johann Hemmerich