Abstract: Different aspects of the invention enable localizing planar repetitive patterns in a time and resource efficient manner by a method and device which computes a homography between the model of the planar object and the query image even in cases of high repeatability and uses multiple views of the same object in order to deal with descriptors variability when the orientation of the object changes.
Type:
Grant
Filed:
May 30, 2016
Date of Patent:
February 16, 2021
Assignee:
THE GRAFFTER S.L.
Inventors:
Luis Baumela Molina, José Miguel Buenaposada Biencinto, Roberto Valle Fernández, Miguel Angel Orellana Sanz, Jorge Remirez Miguel
Abstract: Different aspects of the invention enable localizing planar repetitive patterns in a time and resource efficient manner by a method and device which computes a homography between the model of the planar object and the query image even in cases of high repeatability and uses multiple views of the same object in order to deal with descriptors variability when the orientation of the object changes.
Type:
Application
Filed:
May 30, 2016
Publication date:
July 11, 2019
Applicant:
THE GRAFFTER S.L.
Inventors:
Luis Baumela Molina, José Miguel Buenaposada Biencinto, Roberto Valle Fernández, Miguel Angel Orellana Sanz, Jorge Remirez Miguel