Patents Assigned to The Kansai Electric Co., Inc.
  • Patent number: 7768017
    Abstract: With a view to preventing increases in forward voltage due to a change with the lapse of time of a bipolar semiconductor device using a silicon carbide semiconductor, a buffer layer, a drift layer and other p-type and n-type semiconductor layers are formed on a growth surface, which is given by a surface of a crystal of a silicon carbide semiconductor having an off-angle ? of 8 degrees from a (000-1) carbon surface of the crystal, at a film growth rate having a film-thickness increasing rate per hour h of 10 ?m/h, which is three times or more higher than conventional counterparts. The flow rate of silane and propane material gases and dopant gases is largely increased to enhance the film growth rate.
    Type: Grant
    Filed: December 1, 2004
    Date of Patent: August 3, 2010
    Assignees: The Kansai Electric Co., Inc., Central Research Institution of Electrical Power Industry
    Inventors: Koji Nakayama, Yoshitaka Sugawara, Katsunori Asano, Hidekazu Tsuchida, Isaho Kamata, Toshiyuki Miyanagi, Tomonori Nakamura
  • Patent number: 4892419
    Abstract: A lubricated bearing apparatus for a hydraulic machinery has rotary-side ceramic sliding plates disposed in contact with bearing-side ceramic sliding plates. The rotary-side ceramic sliding plates are disposed in receiving grooves of a main shaft sleeve member fixed to the main shaft. The main shaft sleeve member is provided with preventing portions for preventing the rotary-side ceramics sliding plates from being broken by the centrifugal force. Thus, ceramic materials can be used both on the rotary side and the bearing side, thereby lengthening the usable life of the bearing apparatus.
    Type: Grant
    Filed: June 13, 1988
    Date of Patent: January 9, 1990
    Assignees: Hitachi, Ltd., The Kansai Electric Co., Inc.
    Inventors: Hisao Inoue, Ichiro Hitomi, Osamu Sugimoto, Teiji Horita