Patents Assigned to The Mechanical Social Systems Foundation
  • Dry etching gas
    Patent number: 6514425
    Abstract: Disclosed is fluorocarbon-based dry etching gas which is free of global environmental problems and a dry etching method using a plasma gas obtained therefrom. The dry etching gas includes a fluorinated ether of carbon, fluorine, hydrogen and oxygen and having 2-6 carbon atoms.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: February 4, 2003
    Assignees: Agency of Industrial Science and Technology, The Mechanical Social Systems Foundation of Mita Building, Electronic Industries Association of Japan, Asahi Glass Co., Ltd., Daikin Industries, Ltd. of Umeda Center Building
    Inventors: Akira Sekiya, Tetsuya Takagaki, Shinsuke Morikawa, Shunichi Yamashita, Tsuyoshi Takaichi, Yasuo Hibino, Yasuhisa Furutaka, Masami Iwasaki, Norifumi Ohtsuka
  • Dry etching method
    Patent number: 6383403
    Abstract: A substrate to be etched is subjected to dry etching by using a dry etching gas containing a perfluorocycloolefin while a plasma with a high density region of at least 1010/cm3 is generated. As the perfluorocycloolefin, those having 3 to 8 carbon atoms, especially 4 to 6 carbon atoms are preferably used.
    Type: Grant
    Filed: April 30, 1999
    Date of Patent: May 7, 2002
    Assignees: Japan as represented by the Director General of the Agency of Industrial Science and Technology, The Mechanical Social Systems Foundation, Electronic Industries Association of Japan, Nippon Zeon Co., Ltd.
    Inventors: Akira Sekiya, Toshiro Yamada, Kuniaki Goto, Tetsuya Takagaki
  • Gas composition for dry etching and process of dry etching
    Patent number: 6322715
    Abstract: A gaseous composition for dry etching, comprising a perfluorocycloolefin and 1 to 40% by mole, based on the perfluorocycloolefin, of at least one oxygen ingredient selected from oxygen gas and oxygen-containing gaseous compounds. As the perfluorocycloolefin, those having 3 to 8 carbon atoms, especially 4 to 6 carbon atoms, are preferably used.
    Type: Grant
    Filed: April 30, 1999
    Date of Patent: November 27, 2001
    Assignees: Japan as represented by Director General of the Agency of Industrial Science and Technology, The Mechanical Social Systems Foundation, Electronics Industries Association of Japan, Nippon Zeon Co., Ltd.
    Inventors: Akira Sekiya, Toshiro Yamada, Kuniaki Goto, Tetsuya Takagaki
  • System for discharging thermal decomposition residue containing carbon residue and steel wire balls
    Patent number: 4474524
    Abstract: A system for discharging a thermal decomposition residue containing carbon residue and steel wire balls, the discharge system including: a discharge mechanism including a double shaft screw conveyer having respective screws thereof supported at one end thereof and located contiguous to a residue outlet of a thermal decomposition unit, a housing hermetically connected to the residue outlet of the thermal decomposition unit and enclosing the double shaft screw conveyer with ample space on the upper side thereof; a first outlet provided in a front bottom portion of the housing for discharging the carbon residue transferred by lower portions of the double shaft conveyer; a second outlet provided at the discharging free end of the double screw conveyer for discharging the steel wire balls transferred by upper portions of the double screw conveyer; a seal provided in said first outlet for shielding the interior of the housing from ambient atmosphere; and a water-sealer including a water bath, a chute connected to t
    Type: Grant
    Filed: May 7, 1982
    Date of Patent: October 2, 1984
    Assignees: Kabushiki Kaisha Kobe Seiko Sho, Mechanical Social System Foundation
    Inventors: Shigezo Kawakami, Kunihiko Tsuji, Katuhiko Shimojima, Mitsuru Fukuda, Hiroshi Kawaguchi