Patents Assigned to The Regents of the Univ. of Calif.
  • Synthetic compounds for treatment of inflammation
    Patent number: 6323233
    Abstract: Novel uses of biologically active bis-heterocyclice.g. bis-indole alkaloid compounds which have improved activity are disclosed. Pharmaceutical compositions containing the compounds are also disclosed. Specifically, the novel utility pertains to the anti-immunogenic and neurogenic inflammatory properties exhibited by the bis-indole compounds and their analogs.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: November 27, 2001
    Assignees: Harbor Branch Oceanographic Institution Inc., Regents of the Univ. of Calif.
    Inventors: Amy E. Wright, Ralph-Heiko Mattern, Robert S. Jacobs
  • Cardioplegic solution
    Patent number: 4988515
    Abstract: An improved amino acid enriched cardioplegic solution adapted for use in preventing and treating heart muscle damage due to regional ischemia. The solution includes a calcium ion concentration of between about 50-300 umol, a metabolizable substrate concentration of 400-1000 mg % and an osmolarity of between about 400-500 mOsmols.
    Type: Grant
    Filed: April 5, 1989
    Date of Patent: January 29, 1991
    Assignee: The Regents of the Univ. of Calif.
    Inventor: Gerald D. Buckberg
  • Process for making diamond, and doped diamond films at low temperature
    Patent number: 4961958
    Abstract: A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate located within the vacuum chamber. The substrate temperature is maintained at between about 20.degree.-600.degree. C.
    Type: Grant
    Filed: June 30, 1989
    Date of Patent: October 9, 1990
    Assignee: The Regents of the Univ. of Calif.
    Inventors: Chandra V. Desphandey, Rointan F. Bunshah, Hans J. Doerr
  • Deposition of films onto large area substrates using modified reactive magnetron sputtering
    Patent number: 4931158
    Abstract: An apparatus and process for reactive magnetron sputtering wherein film deposition is controlled by placing a grid located over the primary plasma and an auxiliary plasma adjacent to the substrate. The auxiliary plasma is produced using a positively biased d.c. probe. Control of the deposited film properties is provided by varying the d.c. probe voltage and open area of the wire grid.
    Type: Grant
    Filed: August 8, 1989
    Date of Patent: June 5, 1990
    Assignee: The Regents of the Univ. of Calif.
    Inventors: Rointan F. Bunshah, Chandra V. Deshpandey, Aziz A. Karim