Abstract: Systems and methods for high and ultra-high vacuum physical vapor deposition with in-situ magnetic field are disclosed herein. An exemplary method for depositing a film in an evacuated vacuum chamber can include introducing a sample into the vacuum chamber. The sample can be rotated. A magnetic field can be applied that rotates synchronously with the rotating sample. Atoms can be deposited onto the sample while the sample is rotating with the magnetic field to deposit a film while the magnetic field induces magnetic anisotropy in the film.
Type:
Application
Filed:
October 1, 2014
Publication date:
May 7, 2015
Applicant:
The Trustees of Columbia University in HIe City of
Inventors:
KENNETH L. SHEPARD, William E. Bailey, Noah Andrew Sturcken, Cheng Cheng, Sioan Zohar