Patents Assigned to Thermoceramix, L.L.C.
  • Arc chamber for an ion implantation system
    Publication number: 20010037817
    Abstract: The present invention relates to the fabrication of materials and structures having selected mechanical, thermal and electrical properties. More particularly, the invention relates to the use of these materials and structures in ion implantation systems. Structures comprising boron material provide components for use in implanters including arc chambers with which a beam of ions is generated for implantation into a target such as a semiconductor wafer.
    Type: Application
    Filed: December 18, 2000
    Publication date: November 8, 2001
    Applicant: Thermoceramix, L.L.C.,
    Inventor: Richard C. Abbott
  • Arc chamber for an ion implantation system
    Patent number: 6239440
    Abstract: The present invention relates to the fabrication of materials and structures having selected mechanical, thermal and electrical properties. More particularly, the invention relates to the use of these materials and structures in ion implantation systems. Structures comprising boron material provide components for use in implanters including arc chambers with which a beam of ions is generated for implantation into a target such as a semiconductor wafer.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: May 29, 2001
    Assignee: Thermoceramix, L.L.C.
    Inventor: Richard C. Abbott