Patents Assigned to Thomas West Inc.
  • Smooth pads for CMP and polishing substrates
    Patent number: 7118461
    Abstract: Pads and methods of making the pads for applications such as polishing substrates and chemical mechanical planarization of substrates are provided. The pads include a substantially smooth surface for improved performance.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: October 10, 2006
    Assignee: Thomas West Inc.
    Inventors: Thomas E. West, Guangwei Wu, Donald P. Dietz