Patents Assigned to Three Tec Co., Ltd.
  • Object processing apparatus and plasma facility comprising the same
    Patent number: 7378062
    Abstract: A processing apparatus for subject of the present invention uses a high voltage electrode and a ground electrode, and generates plasma under atmospheric pressure in a reaction passage through which a to-be-processed subject passes. For example, even fluorocompound such as PFC including CF4 can effectively be decomposed because the fluorocompound is brought into contact with plasma in a small space for sufficient time, and the apparatus has a small and simple structure. Therefore, the apparatus can be added to each process chamber.
    Type: Grant
    Filed: May 28, 2001
    Date of Patent: May 27, 2008
    Assignees: Three Tec Co., Ltd., Youth Engineering Co., Ltd.
    Inventors: Ryohei Itatani, Mikio Deguchi, Bencherki Mebarki, Toshihiko Toda, Heitaro Ban, Ryohei Itatani, legal representative, Toshiaki Ishikawa