Patents Assigned to TIÅ AB
  • PLASMA SPUTTERING PROCESS FOR PRODUCING PARTICLES
    Publication number: 20120305385
    Abstract: A high production rate plasma sputtering process for producing particles having a size of 10 ?m or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.
    Type: Application
    Filed: February 22, 2011
    Publication date: December 6, 2012
    Applicant: TIÅ AB
    Inventors: Ulf Helmersson, Nils Brenning, Daniel Soderstrom