Patents Assigned to Toa Nenro Kogyo Kabushiki Kaisha
  • Polysiloxazanes, silicon oxynitride fibers and processes for producing same
    Patent number: 5079323
    Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).
    Type: Grant
    Filed: July 18, 1990
    Date of Patent: January 7, 1992
    Assignee: Toa Nenro Kogyo Kabushiki Kaisha
    Inventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda