Patents Assigned to Tokyo Denpa Co., Ltd.
  • Patent number: 8414828
    Abstract: A material is presented that exhibits excellent corrosion resistance to supercritical ammonia and is suitable for a supercritical ammonia reactor. An Ni-based corrosion resistant alloy includes from 15% or more to 50% or less by mass of Cr and any one or both of Mo and W, wherein a [(content of Mo)+0.5×(content of W)] is from 1.5% or more to 8.5% or less by mass, a value of 1.8×[% content of Cr]/{[% content of Mo]+0.5×[% content of W]} is from 3.0 or more to 70.0 or less and the balance is Ni and an unavoidable impurity. The alloy may be used to configure a supercritical ammonia reactor or the material is coated on a surface that contacts with a supercritical ammonia fluid. The alloy exhibits excellent corrosion resistance to supercritical ammonia and a mineralizer added the supercritical ammonia. The safety and reliability of an apparatus can be improved, the producing cost can be reduced, the apparatus lifetime can be extended and the running cost can be reduced.
    Type: Grant
    Filed: August 22, 2006
    Date of Patent: April 9, 2013
    Assignees: Furuya Metal Co., Ltd., Mitsubishi Chemical Corporation, Tokyo Denpa Co., Ltd., Tsuguo Fukuda, The Japan Steel Works, Ltd.
    Inventors: Yoshihiko Yamamura, Shinya Sato, Shinichi Nishiya
  • Patent number: 8257675
    Abstract: An object of the present invention is to provide an artificial quartz member inhibited from suffering the decrease in transmittance in a laser light wavelength region which is caused by long-term irradiation with a laser light having a wavelength of 200 nm or shorter; and a process for producing the artificial quartz member. The invention provides an artificial quartz member for use as an optical element to be irradiated with a laser light having a wavelength of 200 nm or shorter, having an aluminum content of 200 ppb or lower.
    Type: Grant
    Filed: December 16, 2008
    Date of Patent: September 4, 2012
    Assignees: Tokyo Denpa Co., Ltd., Asahi Glass Company, Limited
    Inventors: Noriyuki Agata, Shinya Kikugawa, Yutaka Shimizu, Kazumi Yoshida, Masatoshi Nishimoto
  • Publication number: 20110204355
    Abstract: A zinc oxide based substrate satisfies a condition that impurities Si, C, Ge, Sn, and Pb which are Group IV elements each have a concentration of 1×1017 cm?3 or less. More preferably, the zinc oxide based substrate 2 satisfies a condition that impurities Li, Na, K, Rb, and Fr which are Group I elements each have a concentration of 1×1016 cm?3 or less. The impurity concentration of a zinc oxide based semiconductor grown on the zinc oxide based substrate can be reduced in this manner.
    Type: Application
    Filed: August 26, 2010
    Publication date: August 25, 2011
    Applicants: ROHM CO., LTD., MITSUBISHI CHEMICAL CORPORATION, TOKYO DENPA CO., LTD.
    Inventors: Takao SUZUKI, Ken NAKAHARA, Hiroyuki YUJI
  • Publication number: 20110117349
    Abstract: To produce a zinc oxide single crystal having a sufficiently low lithium concentration and a high crystallinity. A zinc oxide crystal is grown by hydrothermal synthesis method using a solution having a lithium concentration of 1 ppm or less (weight basis), while suppressing a fluctuation range of crystal growth temperature within 5° C. or at a temperature within the range of 300 to 370° C.
    Type: Application
    Filed: March 24, 2009
    Publication date: May 19, 2011
    Applicants: Fukuda Crystal Laboratory, Tokyo Denpa Co., Ltd., Mitsubishi Chemical Corporation
    Inventors: Yutaka Mikawa, Keiji Fukutomi, Takao Suzuki, Hirohisa Itoh
  • Patent number: 7829207
    Abstract: A manufacture method that can manufacture ZnO based compound semiconductor crystal of good quality. A ZnO substrate is prepared to have a principal surface made of a plurality of terraces of (0001) planes arranged stepwise along an m-axis direction, the envelop of the principal surface being inclined relative to the (0001) plane by about 2 degrees or less. ZnO based compound semiconductor crystal is grown on the principal surface.
    Type: Grant
    Filed: September 27, 2008
    Date of Patent: November 9, 2010
    Assignees: Stanley Electric Co., Ltd., Tokyo Denpa Co., Ltd., Tohoku University
    Inventors: Hiroyuki Kato, Michihiro Sano, Katsumi Maeda, Hiroshi Yoneyama, Takafumi Yao, Meoung Whan Cho
  • Publication number: 20090104103
    Abstract: An object of the present invention is to provide an artificial quartz member inhibited from suffering the decrease in transmittance in a laser light wavelength region which is caused by long-term irradiation with a laser light having a wavelength of 200 nm or shorter; and a process for producing the artificial quartz member. The invention provides an artificial quartz member for use as an optical element to be irradiated with a laser light having a wavelength of 200 nm or shorter, having an aluminum content of 200 ppb or lower.
    Type: Application
    Filed: December 16, 2008
    Publication date: April 23, 2009
    Applicants: Tokyo Denpa Co., Ltd., Asahi Glass Company, Limited
    Inventors: Noriyuki AGATA, Shinya KIKUGAWA, Yutaka SHIMIZU, Kazumi YOSHIDA, Masatoshi NISHIMOTO
  • Patent number: 7438762
    Abstract: A manufacture method that can manufacture ZnO based compound semiconductor crystal of good quality. A ZnO substrate is prepared to have a principal surface made of a plurality of terraces of (0001) planes arranged stepwise along an m-axis direction, the envelop of the principal surface being inclined relative to the (0001) plane by about 2 degrees or less. ZnO based compound semiconductor crystal is grown on the principal surface.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: October 21, 2008
    Assignee: Stanley Electric Co., Ltd., Tokyo Denpa Co., Ltd., and Tohoku University
    Inventors: Hiroyuki Kato, Michihiro Sano, Katsumi Maeda, Hiroshi Yoneyama, Takafumi Yao, Meoung Whan Cho
  • Publication number: 20080056984
    Abstract: Provided is a single crystal with a hexagonal wurtzite structure which is useful as a substrate for various devices and has high purity and is uniform. The single crystal with a hexagonal wurtzite structures which is obtained by a crystal growth on at least an m-plane of a columnar seed crystal and represented by AX (A representing an electropositive element and X representing an electronegative element) is characterized in that a variation in the concentration of a metal other than the electropositive element A and having a concentration of 0.1 to 50 ppm is within 100%.
    Type: Application
    Filed: September 21, 2005
    Publication date: March 6, 2008
    Applicants: Tokyo Denpa Co., Ltd., MITSUBISHI CHEMICAL CORPORATION
    Inventors: Kenji Yoshioka, Hiroshi Yoneyama, Katsumi Maeda, Ikuo Niikura, Mitsuru Sato, Masumi Ito, Fumio Orito
  • Publication number: 20060124051
    Abstract: An objective of the present invention is to provide a zinc oxide (ZnO) single crystal whose electroconductivity is excellent and which has a high quality. The invention relates to a zinc oxide single crystal whose concentration of metals other than zinc in the crystal fulfills the following equation: [?cM]/[+cM]?3 wherein M is a metal other than zinc, [?cM] is a concentration of M in a ?c region in the zinc oxide crystal, and [+cM] is a concentration of M in a +c region in the zinc oxide crystal.
    Type: Application
    Filed: September 30, 2005
    Publication date: June 15, 2006
    Applicants: MITSUBISHI CHEMICAL CORPORATION, Tokyo Denpa Co., Ltd.
    Inventors: Kenji Yoshioka, Hiroshi Yoneyama, Katsumi Maeda, Ikuo Niikura, Mitsuru Sato, Masumi Ito
  • Patent number: 4986670
    Abstract: A temperature measurement device is provided with a temperature sensing element which contains a quartz resonator having a quartz oscillating crystal whose ratio of width to thickness is in the range of 9.48 to 9.69, and an antenna which receives stimulus for the quartz oscillating crystal and transmits waves of reverberatory oscillation. The temperature measurement device is capable of measuring temperatures in the range of normal room temperature to extremely low temperatures (4.degree. K.).
    Type: Grant
    Filed: November 17, 1989
    Date of Patent: January 22, 1991
    Assignees: Agency of Industrial Science & Technology, Ministry of International Trade, Tokyo Denpa Co., Ltd.
    Inventors: Futoshi Uchiyama, Ko Agatsuma, Takeshi Ohara, Koichi Tsukamoto, Sumiyuki Ishigami, Mitsuru Sato, Hisashi Sugimoto