Patents Assigned to Tokyo Electric Limited
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Patent number: 9150965Abstract: A processing apparatus includes a gas supply passage for supplying a corrosive gas having a halogen, a part of the passage being made of a metal; a stabilization reaction unit which has an energy generator for supplying light energy or heat energy to the corrosive gas that has passed through the metallic part of the gas supply passage and/or has an obstacle configured to apply a collision energy to the corrosive gas that has passed through the metallic part of the gas supply passage, the collision energy being generated from a collision between the obstacle and said corrosive gas. A reaction for stabilizing a compound containing the metal and the halogen contained in the corrosive gas takes place by means of at least one of the light energy, heat energy, and collision energy; and a trapping unit which traps the compound stabilized in the stabilization reaction unit.Type: GrantFiled: March 30, 2010Date of Patent: October 6, 2015Assignee: TOKYO ELECTRIC LIMITEDInventors: Shuji Moriya, Toyohiko Shindo, Noboru Tamura
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Patent number: 7207340Abstract: A gas removal system that removes a halogen gas remaining inside a processing chamber after executing a specific type of processing inside the processing chamber maintained in an airtight state with plasma obtained through discharge dissociation of the halogen gas supplied from a gas supply device comprises a pressure control device that controls the pressure inside the processing chamber, an air supply device that supplies the atmospheric air into the processing chamber after the pressure inside the processing chamber is lowered by the pressure control device, a control device that controls the air supply device and an evacuation device that evacuates a gas produced through a reaction of the halogen gas and the atmospheric air having occurred inside the processing chamber.Type: GrantFiled: December 7, 2001Date of Patent: April 24, 2007Assignee: Tokyo Electric LimitedInventors: Kosuke Imafuku, Daisuke Hayashi
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Patent number: 7077917Abstract: A processing chamber having an improved sealing means is disclosed. The processing chamber comprises a lower element, an upper element, and a sealing means that tightly holds the lower element to the upper element to define a processing volume that is maintained using the minimum pressure necessary. The processing chamber comprises a plate having a first face that forms the processing volume and a second, opposing face that forms a seal-energizing cavity. In one embodiment, a surface area of the first face is smaller than a surface area of the second face. When the same pressure is applied against both the first face and the second face, the force on the second face is greater than the force on the first face, resulting in a sealing force exceeding a processing force generated within the processing volume.Type: GrantFiled: February 10, 2003Date of Patent: July 18, 2006Assignee: Tokyo Electric LimitedInventor: William Dale Jones
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Patent number: 6790289Abstract: There is provided a method of cleaning completely a deposit on the surface of the member to be cleaned, of a plasma processing apparatus without any damage of the coating which has been formed anodized coating or sprayed coating on the surface of the member to cleaned. The method of cleaning comprises a chemical cleaning step of dipping in an organic solvent (e.g. acetone) (a); and then a step blowing pressurized air so as to remove the deposit which has been peeled from a buffer plate (14) treated chemically (b); and then, of removing physically the deposit remained at the edges of the buffer plate (14) by blasting by using a CO2 blast apparatus (105), and f steps of dipping the buffer plate (14) in pure water (104), and imparting supersonic vibration to remove the deposit remaining on a buffer plate (14).Type: GrantFiled: March 12, 2003Date of Patent: September 14, 2004Assignee: Tokyo Electric LimitedInventors: Taira Takase, Nobuyuki Nagayama, Kouji Mitsuhashi, Hiroyuki Nakayama
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Patent number: 6311091Abstract: A substrate processing apparatus for coating resist onto a substrate and developing the coated resist, comprising a power supply equipped with a main switch controlled in an ON/OFF manner, a plurality of electric appliances operated substantially in the same manner when power is supplied from the power supply, a power distribution circuit for supplying power to each of the plurality of electric appliances, and a control section connected to the power distribution circuit, for controlling power-supply timing to the plurality of electric appliances. The control section staggers power-supply timing to each of the electric appliances when the main switch is turned on.Type: GrantFiled: October 19, 1998Date of Patent: October 30, 2001Assignee: Tokyo Electric LimitedInventor: Yutaka Yamahira
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Patent number: 4312596Abstract: A beating blade member for beating or whipping cooking material such as egg into froth. The blade member has blades each of which has a vertically stretched and radially extending beating surface in which formed are a multiplicity of meshes. Thanks to the provision of these meshes, it is possible to obtain fine contact of the material with the blade to promote the stirring and beating. Also, these meshes effectively catch the ambient air to permit a better mixing of the material with the air. At the same time, the material is guided to flow radially inwardly, as well as in the vertical direction, so as to ensure the interference of the material with the meshes of the blades. Consequently, the material is beaten and whipped into froth in quite a short period of time.Type: GrantFiled: May 15, 1979Date of Patent: January 26, 1982Assignee: Tokyo Electric LimitedInventors: Kazuo Maezawa, Yasuo Doumoto