Patents Assigned to Tokyo Electron Arizona Inc.
  • Soft plasma ignition in plasma processing chambers
    Patent number: 6190512
    Abstract: The specification discloses a power supply circuit which reduces oscillations generated upon ignition of a plasma within a processing chamber. A secondary power supply pre-ignites the plasma by driving the cathode to a process initiation voltage. Thereafter, a primary power supply electrically drives the cathode to generate plasma current and deposition on a wafer.
    Type: Grant
    Filed: September 7, 1993
    Date of Patent: February 20, 2001
    Assignee: Tokyo Electron Arizona Inc.
    Inventor: Alexander D. Lantsman