Patents Assigned to Tokyo Electron Co., Ltd.
  • Internal member for plasma-treating vessel and method of producing the same
    Publication number: 20050147852
    Abstract: It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
    Type: Application
    Filed: March 7, 2005
    Publication date: July 7, 2005
    Applicants: Tocalo Co., Ltd., Tokyo Electron Co., Ltd.
    Inventors: Yoshio Harada, Junichi Takeuchi, Tatsuya Hamaguchi, Nobuyuki Nagayama, Kouji Mitsuhashi
  • Internal member for plasma-treating vessel and method of producing the same
    Patent number: 6884516
    Abstract: It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: April 26, 2005
    Assignees: Tocalo Co., Ltd., Tokyo Electron Co., Ltd.
    Inventors: Yoshio Harada, Junichi Takeuchi, Tatsuya Hamaguchi, Nobuyuki Nagayama, Kouji Mitsuhashi
  • Internal member for plasma-treating vessel and method of producing the same
    Publication number: 20040214026
    Abstract: It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
    Type: Application
    Filed: May 21, 2004
    Publication date: October 28, 2004
    Applicants: Tocalo Co., Ltd., Tokyo Electron Co., Ltd.
    Inventors: Yoshio Harada, Junichi Takeuchi, Tatsuya Hamaguchi, Nobuyuki Nagayama, Kouji Mitsuhashi
  • Plasma processing container internal member and production method thereof
    Patent number: 6783863
    Abstract: It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
    Type: Grant
    Filed: August 3, 2001
    Date of Patent: August 31, 2004
    Assignees: Tocalo Co., Ltd., Tokyo Electron Co., Ltd.
    Inventors: Yoshio Harada, Junichi Takeuchi, Tatsuya Hamaguchi, Nobuyuki Nagayama, Kouji Mitsuhashi