Abstract: A plasma etching device includes a baffle plate having a plurality of slots for preventing leakage of plasma gas generated during a plasma generating process while discharging other materials such as exhaust gas, residual products and particles generated during the process. The slots, each of which extends in the form of a curve from an inner circumference of the baffle plate to an outer circumference thereof, expedites the discharge of the exhaust gas and residual products. Therefore, the plasma generating progresses more smoothly and, further, an amount of discharged exhaust gas is increased.