Patents Assigned to Tokyo Electron Limeted
  • Method and apparatus for an improved baffle plate in a plasma processing system
    Patent number: 6837966
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: January 4, 2005
    Assignee: Tokyo Electron Limeted
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hiroyuki Nakayama