Patents Assigned to Tokyo Electron Limitetd
  • Patent number: 7953512
    Abstract: The present invention provides a substrate processing system, a control method for a substrate processing apparatus, and a program for the system and/or method, each of which is intended to achieve effective control for a film-forming amount on processed substrates. The substrate processing system includes a substrate processing unit adapted for forming a film on each of the plurality of substrates; a pattern obtaining unit adapted for obtaining information about an arrangement pattern concerning arrangement of unprocessed substrates and processed substrates among the plurality of substrates; and a memory unit adapted for storing therein an arrangement/film-forming-amount model indicative of influence exerted on the film-forming amount on the substrates by the arrangement of the unprocessed substrates and processed substrates among the plurality of substrates.
    Type: Grant
    Filed: September 4, 2008
    Date of Patent: May 31, 2011
    Assignee: Tokyo Electron Limitetd
    Inventors: Yuichi Takenaga, Tatsuya Yamaguchi, Wenling Wang, Toshihiko Takahashi, Masato Yonezawa