Abstract: The present invention relates to a cleaning treatment apparatus wherein two neighboring treatment chambers are allowed to communicate through a communicating opening provided in a lower portion of a separating wall that separates the two treatment chambers, and a movable treatment tank containing a treatment liquid is arranged in a movable manner within the two treatment chambers. The liquid contained in the movable treatment tank and the separating wall are in contact and the two treatment chambers are covered. This configuration ensures that the atmospheres in the two treatment chambers are mutually isolated so that the movable treatment tank can be used in both treatment chambers, the overall apparatus can be made more compact, and also the amount of treatment liquid used can be reduced. In addition, there is no need for a wafer conveyor means, so throughput can also be improved.

Abstract: The present invention relates to a cleaning apparatus comprising a plurality of processing tanks containing cleaning liquids, a conveyor mechanism for conveying an object to be cleaned and immersing the object to be cleaned into the processing tanks, a dilutent liquid supply device for supplying a dilutent liquid through a piping-system in order to dilute waste liquid from the processing tanks, and a waste liquid sump for collecting diluted waste liquid. The waste liquid sump is provided with a temperature measurement device for detecting the temperature of waste liquid in the waste liquid sump, and the amount of dilutent liquid supplied from the dilutent liquid supply device is controlled by a temperature control device in accordance with a temperature measurement result from the temperature measurement device. The cleaning apparatus is also provided with a fixing device for joints of the piping system.

Abstract: A wafer conveyor apparatus which moves a wafer moving device which moves wafers housed in a wafer cassette and performs conveyance the wafers, comprises a first arm provided with a light emitting device, a second arm provided with a light receiving device that detects light emitted from the light emitting device, and a wafer detector that has a judgment device for judging the presence or absence or a housing status of a wafer inside a wafer cassette on the basis of the output information of the light receiving device.