Patents Assigned to TOKYO OHA KOGYO CO., LTD.
  • Negative resist composition, method of forming resist pattern, and complex
    Patent number: 9366960
    Abstract: A negative resist composition including a complex represented by the general formula (1); and a polymerization initiator. in which M represents hafnium (Hf) or zirconium (Zr), X represents a ligand including a conjugate base of an acid which has an acid dissociation constant (pKa) of 3.8 or less and has a polymerizable group, Y represents a ligand having no polymerizable group, and n represents an integer of 1 to 4.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: June 14, 2016
    Assignee: TOKYO OHA KOGYO CO., LTD.
    Inventors: Naoki Yamashita, Yoshitaka Komuro, Yoshiyuki Utsumi, Daiju Shiono
  • POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
    Publication number: 20090098483
    Abstract: A positive resist composition and method for forming a resist pattern are provided which enable a resist pattern with excellent shape to be obtained.
    Type: Application
    Filed: April 7, 2006
    Publication date: April 16, 2009
    Applicant: TOKYO OHA KOGYO CO., LTD.
    Inventors: Yohei Kinoshita, Makiko Irie, Waki Ohkubo, Yusuke Nakagawa, Shinichi Hidesaka