Patents Assigned to Tokyo Ohka Kogyo Co., Ltd., a Japan corporation
  • Photosensitive composition for sandblasting and photosensitive film using the same
    Publication number: 20040175659
    Abstract: A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
    Type: Application
    Filed: March 16, 2004
    Publication date: September 9, 2004
    Applicant: Tokyo Ohka Kogyo Co., Ltd., a Japan corporation
    Inventors: Akira Kumazawa, Ryuma Mizusawa, Syunji Nakazato, Hiroyuki Obiya
  • Insulating paste composition for rib formation and method of rib pattern formation
    Publication number: 20030059543
    Abstract: An insulating paste composition for rib formation which comprises an insulating material, an organic binder, a light-absorbing substance, and an organic solvent. A rib pattern is formed by sandblasting an insulating layer formed of the composition using a lithographically formed resin pattern mask. The composition forms an antireflective insulating layer which can provide a rib pattern excellent in cross-sectional contour and dimensional precision.
    Type: Application
    Filed: March 8, 2002
    Publication date: March 27, 2003
    Applicant: Tokyo Ohka Kogyo Co., Ltd., a Japan corporation
    Inventors: Syunji Nakazato, Hiromitsu Sato, Hiroyuki Obiya, Hiroyuki Nishimura