Patents Assigned to Tokyo Ohka Tokyo Co., Ltd.
  • Resist composition for immersion exposure and method of forming resist pattern using the same
    Patent number: 8142979
    Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).
    Type: Grant
    Filed: June 10, 2009
    Date of Patent: March 27, 2012
    Assignee: Tokyo Ohka Tokyo Co., Ltd.
    Inventors: Tsuyoshi Kurosawa, Hiroaki Shimizu