Patents Assigned to TORAY COATEX CO., LTD
  • Publication number: 20230002963
    Abstract: A moisture-permeable waterproof fabric includes: a porous moisture-permeable waterproof membrane on at least one surface of a fabric. Polyurethane forming the moisture-permeable waterproof membrane is synthesized using a polyol including a polycarbonate diol having a plant-derived component.
    Type: Application
    Filed: December 25, 2020
    Publication date: January 5, 2023
    Applicants: TORAY COATEX CO., LTD., TORAY INDUSTRIES, INC.
    Inventors: Kohei YAMADA, Kaori OKUMURA, Yohei NAKAYA, Takehiro UEDA
  • Patent number: 9707663
    Abstract: A polishing pad is provided with a compression elastic modulus of 0.17 MPa or more and 0.32 MPa or less produced by preparing a nonwoven fabric formed of bundles of ultrafine fibers with an average monofilament diameter of 3.0 ?m or more and 8.0 ?m or less, preparing a polishing pad base by impregnating the nonwoven fabric with a polyurethane based elastomer in an amount of 20 mass % or more and 50 mass % or less relative to the mass of the polishing pad base, and laminating the polishing pad base with a porous polyurethane layer containing wet-solidified polyurethane as primary component which has openings with an average opening diameter of 10 ?m or more and 90 ?m or less in its surface to serve as polishing surface layer.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: July 18, 2017
    Assignees: Toray Industries, Inc., Toray Coatex Co., Ltd.
    Inventors: Kuniyasu Shiro, Masaharu Wada, Hiroyasu Kato, Hajime Nishimura, Satoshi Yanagisawa, Yukihiro Matsuzaki
  • Publication number: 20130331014
    Abstract: A polishing pad is provided with a compression elastic modulus of 0.17 MPa or more and 0.32 MPa or less produced by preparing a nonwoven fabric formed of bundles of ultrafine fibers with an average monofilament diameter of 3.0 ?m or more and 8.0 ?m or less, preparing a polishing pad base by impregnating the nonwoven fabric with a polyurethane based elastomer in an amount of 20 mass % or more and 50 mass % or less relative to the mass of the polishing pad base, and laminating the polishing pad base with a porous polyurethane layer containing wet-solidified polyurethane as primary component which has openings with an average opening diameter of 10 ?m or more and 90 ?m or less in its surface to serve as polishing surface layer.
    Type: Application
    Filed: January 30, 2012
    Publication date: December 12, 2013
    Applicants: TORAY INDUSTRIES, INC., TORAY COATEX CO., LTD
    Inventors: Kuniyasu Shiro, Masaharu Wada, Hiroyasu Kato, Hajime Nishimura, Satoshi Yanagisawa, Yukihiro Matsuzaki