Abstract: Disclosed is an inspection method for inspecting the electrical characteristics of a device by bringing an inspecting probe into electrical contact with an inspection electrode. An insulating film formed on the surface of the inspection electrode is broken by utilizing a fritting phenomenon so as to bring the inspection electrode into electrical contact with the inspection electrode.
Type:
Application
Filed:
May 2, 2006
Publication date:
August 31, 2006
Applicants:
TOKYO ELECTON LIMITED, TADATOMO SUGA, TOSHIHIRO ITOH
Abstract: Disclosed is an inspection method for inspecting the electrical characteristics of a device by bringing an inspecting probe into electrical contact with an inspection electrode. An insulating film formed on the surface of the inspection electrode is broken by utilizing a fritting phenomenon so as to bring the inspection electrode into electrical contact with the inspection electrode.
Type:
Application
Filed:
March 18, 2004
Publication date:
September 9, 2004
Applicants:
TOKYO ELECTRON LIMITED, TADATOMO SUGA, TOSHIHIRO ITOH
Abstract: Disclosed is an inspection method for inspecting the electrical characteristics of a device by bringing an inspecting probe into electrical contact with an inspection electrode. An insulating film formed on the surface of the inspection electrode is broken by utilizing a fritting phenomenon so as to bring the inspection electrode into electrical contact with the inspection electrode.
Type:
Grant
Filed:
August 20, 2001
Date of Patent:
August 17, 2004
Assignees:
Tokyo Electron Limited, Tadatomo Suga, Toshihiro Itoh