Patents Assigned to Toshio Goto
  • Plasma source and plasma processing apparatus
    Publication number: 20070017636
    Abstract: A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).
    Type: Application
    Filed: May 28, 2004
    Publication date: January 25, 2007
    Applicants: Toshio Goto, Tokyo Electron Limited, Katagiri Engineering Co., Ltd.
    Inventors: Toshio Goto, Masaru Hori, Nobuo Ishii, Shoji Den