Patents Assigned to TOSOH COPORATION
  • ETCHING COMPOSITION AND METHOD FOR ETCHING A SUBSTRATE
    Publication number: 20090008366
    Abstract: This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound.
    Type: Application
    Filed: September 11, 2008
    Publication date: January 8, 2009
    Applicant: TOSOH COPORATION
    Inventors: Yasushi HARA, Fumiharu Takahashi, Hiroaki Hayashi