Abstract: A first wafer is provided, and a photosensitive masking-and-bonding pattern is formed on the surface of the first wafer. Then, an etching process using the photosensitive masking-and-bonding pattern as a hard mask is performed to form a wafer pattern on the surface of the first wafer. Finally, the first wafer is bonded to a second wafer with the photosensitive masking-and-bonding pattern.
Type:
Grant
Filed:
January 20, 2005
Date of Patent:
March 20, 2007
Assignee:
Touch Micro-Systems Technology Inc.
Inventors:
Shih-Feng Shao, Hsin-Ya Peng, Chen-Hsiung Yang