Abstract: An ultraviolet sensor that may include a group of serially connected photovoltaic diodes of alternating polarities; a selective blocking portion that is configured to prevent ultraviolet radiation from reaching photovoltaic diodes that belong to the group and are of a first polarity, while allowing the ultraviolet radiation to reach photovoltaic diodes that belong to the group and are of a second polarity; and an interface for providing an output signal of the group, the output signal is indicative of ultraviolet radiation sensed by the photovoltaic diodes that belong to the group and are of the second polarity.

Abstract: A LDMOS transistor that may include (i) a first region that is a reduced surface field (RESURF) implant region of a first type; (ii) a second region that is a RESURF implant region of a second type, wherein the first type differs from the second type; (iii) a gate; (iv) a stepped oxide region and a gate oxide region that are positioned above the first region and below the gate.

Abstract: An operational transconductance amplifier, that may include a first differential pair that comprises a first transistor and a second transistor that are coupled to each other at a certain node; wherein the first differential pair is configured to convert a differential input voltage to first and second output currents; a current source that is coupled to the certain node and may include an adjustable current sources; and a feedback unit that is coupled to the certain node and is configured to (a) receive the differential input voltage, and maintain a voltage of the certain node substantially fixed regardless of changes in the differential input voltage.

Abstract: A method for manufacturing a semiconductor device, the method may include forming a first part of a hollow in first part of a first layer of the semiconductor device and coating a sidewall of the first part of the hollow with an etch stop material, wherein the forming of the first part of the hollow comprises performing at least one iteration of (i) anisotropic etching and (ii) deposition of the etch stop material; wherein when completed, the semiconductor device comprises a radio frequency (RF) circuit; forming a second part of the hollow in a second part of the first layer by performing isotropic etching that involves directing plasma through the first part of the hollow; wherein the second part of the hollow reaches either (a) a bottom of a second layer of the semiconductor device or (b) the RF circuit; and wherein at least a majority of the second part of the hollow is wider than at least a majority of the first part of the hollow.

Abstract: A system that may include (a) a radiation source that is constructed and arranged to illuminate an object with radiation during consecutive time frames of microsecond-scale duration, wherein radiation emitted during one time frame differs by energy from radiation transmitted during an adjacent time frame; and (b) a CMOS sensor that may include a readout circuit and CMOS pixels. Each CMOS pixel may include a radiation sensing element and in-pixel memory elements. Different in-pixel memory elements are constructed and arranged to sample a state of the radiation sensing element during different time frames of the consecutive time frames.

Abstract: A semiconductor die that may include a substrate; an epitaxial layer; a metal layer; a first transistor; and a metal via that surrounds the first transistor, extends between the metal layer and the substrate, and penetrates the substrate.

Abstract: A laterally diffused metal oxide semiconductor (LDMOS) device that may include an oxide region that comprises a bottom surface; a drain that is positioned between a left drift region and a right drift region and below the bottom surface; wherein the oxide region further comprises a first sloped surface and a second sloped surface; wherein a first angle between the first sloped surface and the bottom surface does not exceed twenty degrees; and wherein a second angle between the second sloped surface and the bottom surface of the oxide region does not exceed twenty degrees.

Abstract: A double-RESURF LDMOS fabrication method utilizes a shared mask to form separately patterned N+ buried layer (NBL) and P+ buried layer (PBL) regions. The mask includes two opening types (e.g., large and small), and the P-type and N-type implant materials are separately directed onto the mask at different implant angles, such that the N-type implant passes through both opening types to form a first pattered implant region in both a first region and a surrounding second region, and such that the P-type implant material passes only through the larger openings and forms a second pattered implant region only in the first substrate portion. An optional epitaxial layer is deposited over the substrate and annealed to form the separately patterned PBL and NBL in the epitaxial layer, where a portion of the PBL diffuses above the NBL and forms a P-surf region below the LDMOS's N-drift region.

Abstract: A method for programming an NROM cell which includes the steps of applying a drain, a source and a gate voltage to the cell and verifying a programmed of a non-programmed state of the cell. If the cell is in the non-programmed state, the method includes the steps of increasing the drain voltage and maintaining the gate voltage at a constant level during at least a part of the step of increasing. The steeps of applying, verifying, increasing and maintaining are repeated until the cell reaches the programmed state.

Abstract: A delay device for delaying the activation of a sensing indication signal includes a reference word-line, a reference word-line driver, and a comparator. The reference word-line driver is controlled by a strobe signal, and is connected to the reference word-line and a reference word-line voltage. Additionally, when so indicated by the strobe signal, the reference word-line driver provides the reference word-line voltage to the reference word-line. The comparator is connected to the reference word-line and to the reference word-line voltage and activates the sensing indication signal when the voltage on the reference word-line is at least equal to a predetermined function of the reference word-line voltage.

Abstract: A method for manufacturing a memory array having a plurality of memory cells thereon and diffusion areas therebetween includes the steps of laying down a layer of silicon nitride, defining the diffusion areas and creating diffusion oxides over the diffusion areas. Both steps of laying down and defining occur without etching any part of the layer of silicon nitride. The step of creating diffusion oxides includes the steps of creating porous silicon nitride from portions of the silicon nitride layer wherever diffusion oxides are desired (typically by laying down photoresist in a desired pattern and bombarding the silicon nitride layer with ions) and oxidizing both the porous silicon nitride and the silicon substrate through the porous silicon nitride thereby to create silicon oxy-nitride and silicon dioxide, respectively. The present invention also includes a semiconductor chip having diffusion or bit line oxides formed of at least silicon oxy-nitride.

Abstract: A method for sensing a close to ground signal recieved from an array cell within a memory array includes the steps of providing a reference unit with a reference cell having a similar structure and a similar current path therethrough to that of the array cell, providing a timing unit with a timing cell having a similar structure and a similar current path therethrough to that of the array cell, discharging the array, the reference unit and the timing unit prior to charging them, generating a cell signal, a reference signal and a timing signal, respectively, upon charging, generating a read signal when the timing signal at least reaches a predefined voltage level and generating a sensing signal from the difference of the cell and reference signals once the read signal is generated. The reference unit has a reference capacitance which is a multiple of the expected capacitance of a bit line of the array and the timing unit has a predefined timing capacitance.