Abstract: The liquid crystal display device according to the present invention includes a pair of substrates, and a liquid crystal layer disposed between the pair of substrates, wherein the liquid crystal layer includes a liquid crystal material having a negative dielectric constant anisotropy, at least one of the pair of substrates is provided with an alignment film for vertically aligning adjacent liquid crystal molecules, and a polymer layer formed on the alignment film for controlling the alignment of the adjacent liquid crystal molecules, the polymer layer is formed by polymerization of at least one monomer, the polymerization being initiated by radicals generated of the monomer upon absorption of light, the alignment film includes a polymer compound having a main chain that contains an imide structure, and the main chain has an imidization ratio of 50% or more.

Abstract: The invention provides 2,2-dimethoxy-1,2-di-[4-(meth)acryloyloxy]phenylethane-1-one represented by the following formula (A): (wherein R1 and R2, which may be identical to or different from each other, each represent a hydrogen atom or a methyl group).

Abstract: Several aspects of the present invention provide a liquid crystal composition capable of shortening the takt time and achieving excellent display qualities, and a liquid crystal display device and a method for producing a liquid crystal display device which use the liquid crystal composition. The liquid crystal composition of several aspects of the present invention includes a liquid crystal material and one or more kinds of radical polymerizable monomers, at least one kind of the radical polymerizable monomers being a compound generating radicals through a self-cleavage reaction by exposure to light and having at least two radical polymerizable groups.

Abstract: A resinous structure derived from fluorine-containing polymers useful as a mold with dimensional stability is disclosed.

Abstract: Described is a resinous article of manufacture that is wrinkle-resistant and is warpage-resistant when subjected to very high temperatures. Such an article is useful as an optical lens.

Abstract: Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Abstract: The invention provides 2,2-dimethoxy-1,2-di-[4-(meth)acryloyloxy]phenylethane-1-one represented by the following formula (A): (wherein R1 and R2, which may be identical to or different from each other, each represent a hydrogen atom or a methyl group).

Abstract: The present invention provides a composition for forming a liquid crystal layer which enables to achieve takt time reduction and high display quality. The liquid crystal display device according to the present invention includes a liquid crystal material, and a monomer, the monomer being a compound having a structure that generates ketyl radicals when undergoing a hydrogen abstraction reaction caused by exposure to light.

Abstract: The present invention provides a composition for forming a liquid crystal layer from which a liquid crystal display device hardly generating image sticking can be obtained.

Abstract: A sulfonic acid derivative represented by the following general formula (1): [Chemical formula 1] RCOOCH2CH2CFHCF2SO3?M+??(1) where R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group, and M+ represents a counter cation.

Abstract: A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X?represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).

Abstract: The present invention provides a frozen cell immobilized product which is obtained by applying a technique for freezing cultured cells to a technique for forming primary hepatocyte spheroids through co-culturing, and which can improve performance in an examination or a test using the technique for forming primary hepatocyte spheroids; a primary hepatocyte culture tool; and a method for producing the primary hepatocyte culture tool. According to the invention, a cell-adhesion region of a culture substrate is defined in a pattern; animal-derived adherent cells are cultured on the cell-adhesion region; and the cultured cells are frozen together with a freezing culture medium.

Abstract: The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.

Abstract: An object of the invention is to provide a novel dendritic polymer serving as an organic semiconductor material which is isotropic and which exhibits remarkably high carrier conductivity. Another object of the invention is to provide an electronic device employing the dendritic polymer. These objects are attained by a dendritic polymer having a branching structure including repeating units each having a branch portion, each of said repeating units having a structure represented by formula (1), and containing a linear portion X formed of an optionally substituted divalent organic group and a branch portion Y formed of an optionally substituted trivalent organic group: characterized in that the linear portion X contains at least one thienylene moiety and is at least partially conjugated with the branch portion Y, and in that the polymer reversibly assumes an insulative state and a metallic state, depending on the presence of an external factor.

Abstract: To produce a cell culture container which is suitable for use in, for example, biochemical experiments, clinical experiments, and research and development of drugs. The production of the cell culture container includes providing a cell culture container base 1 having a plurality of wells serving as regions for culturing cells; applying a hydrophilic photosensitive composition to the bottom surface of each of the wells, to thereby form a coating 3; subjecting the coating 3 to patternwise light exposure; and removing an uncured portion of the coating through development, to thereby yield a cell culture container having, on the bottom surface of each well, a patterned hydrophilic coating layer formed of a photo-cured product.

Abstract: The photosensitive resin composition is composed of a poly((meth)acrylic acid)-based water-soluble photo-sensitive resin (A) having an acid value of 150 mgKOH/g or more on a solid basis; the resin (A) being formed of a ((meth)acrylic acid)-based polymer in which a compound represented by formula (1): (wherein R1 represents H or Me; and R2 represents a liner or branched C2-C10 alkylene group) has been added to portions of the carboxylic groups, a photopolymerization initiator (B); and water (C).

Abstract: The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X? represents an anion.

Abstract: A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under hydrous conditions as well as exhibiting high cure-related sensitivity and high flexibility and being uniformly solidified even under highly hydrous conditions, a photosensitive resin composition containing the resin, and a novel compound. The photosensitive resin is a saponified poly(vinyl acetate)-based photosensitive resin having a structural unit represented by formula (1): (wherein R1 represents H or Me; R2 represents a linear or branched C2-C10 alkylene group; n is an integer of 1 to 3; X represents m is an integer of 0 to 6; and Y represents an aromatic ring or a single bond).

Abstract: The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, through drying, forms a resist film having a softening point falling within range of 30 to 120 C and that the epoxy resin is represented by formula (1): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nK falls within a range of 1 to 100; and each of “A”s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (2): (wherein X represents any of groups represented by formulas (3) to (5): and at least two groups represented by formula (3) are contained in one molecule of the epoxy resin))

Abstract: The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X? represents an anion.