Patents Assigned to Toyo Gosei Kogyo, Ltd.
  • Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
    Patent number: 6020093
    Abstract: The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.
    Type: Grant
    Filed: May 13, 1998
    Date of Patent: February 1, 2000
    Assignee: Toyo Gosei Kogyo, Ltd.
    Inventors: Toru Shibuya, Jian Rong Xie, Noriaki Tochizawa