Patents Assigned to Toyo Technologies, Inc.
  • Patent number: 7525213
    Abstract: A wave activated power generation device includes a cylindrical floating body anchored on water and extending vertically to a water surface, a ballast provided at a lower end portion of the floating body, and a power generating equipment provided at an upper end portion of the floating body. The floating body includes a buoyancy control chamber allowing the floating body to vertically float in the water and adjusting a position of the floating body relative to the water surface to a predetermined height in accordance with a relation between buoyancy of the floating body and weight of the ballast, and an air chamber formed between the buoyancy control chamber and the power generating equipment. The power generating equipment includes an air turbine provided above the air chamber and driven by air flow generated between an inside and outside of the air chamber by vertical motion of the water surface, and a generator rotationally driven by the air turbine.
    Type: Grant
    Filed: September 22, 2005
    Date of Patent: April 28, 2009
    Assignee: Toyo Technology Inc.
    Inventors: Yoshihiro Nagata, Toshio Konno
  • Publication number: 20080088133
    Abstract: A wave activated power generation device includes a cylindrical floating body anchored on water and extending vertically to a water surface. a ba last provided at a lower end portion of the floating body and a power generating equipment provided at an upper end portion of the floating body The floating body includes a buoyancy control chamber allowing the floating body to vertically float in the water and adjusting a position of the floating body relative to the water surface to a predetermined height in accordance with a relation between buoyancy of the floating body and weight of the ballast, ad an air chamber formed between the buoyancy control chamber and the power generating equipment. The power generating equipment includes an air turbine provided above the air chamber and driven by air flow generated between a inside and outside of the air chamber by vertical motion of the water surface, ad a generator rotationally driven by the air turbine.
    Type: Application
    Filed: September 22, 2005
    Publication date: April 17, 2008
    Applicant: TOYO TECHNOLOGY INC.
    Inventors: Yoshihiro Nagata, Toshio Konno
  • Patent number: 6805783
    Abstract: A device and method for pumping an electrolyte solution includes a conduit having a first end, a second end and a lumen for containing the electrolyte solution. An opening at each end of the conduit allows electrolyte solution to enter and exit the lumen of the conduit. The device further includes a ferroelectric member that is positioned along a portion of the conduit. The ferroelectric member is formed with a contact surface for interaction with the electrolyte solution. An electrode is positioned adjacent to the ferroelectric member to polarize the ferroelectric member and charge the contact surface. Driving electrodes are positioned to establish a potential difference in the electrolyte solution across the portion of the conduit containing the ferroelectric member.
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: October 19, 2004
    Assignee: Toyo Technologies, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6619925
    Abstract: An electro-osmotic pump, for transporting aqueous solutions in micro-fluidics, has a tubular-shaped pumping section which includes a pump tube that is connected in fluid communication with an extension tube. A thread of silica fibers is positioned in the lumen of the pump tube, and an aqueous solution that will interact with the thread is introduced into the pump tube lumen to charge the aqueous solution. In operation, a voltage potential is selectively applied between the pump tube and the extension tube to establish a ground-potential-ground electric field along the pumping section. This creates a force on the charged aqueous solution that moves it through the pump tube and, consequently, also moves fluid through the extension tube. Various embodiments of the electro-osmotic pump are envisioned, including the serial connection of several pumping sections, for use as valves, switches or pumps.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: September 16, 2003
    Assignee: Toyo Technologies, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6106683
    Abstract: A device and method for polishing the surface of a substrate uses a vessel for holding a plasma in a magnetic field. Further, the magnetic field is selectively oriented in the vessel relative to the substrate surface. An ion accelerator is then activated to accelerate ions from the plasma on a curved path toward the substrate. By controlling the strength of the magnetic field, and the r-f power and frequency needed to accelerate the ions, the accelerated ions are sent on the curved path for collision with the substrate surface. These collisions, which occur at grazing angles in the range of 0.degree.-20.degree., remove atoms from the substrate surface and thereby polish the surface.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: August 22, 2000
    Assignee: Toyo Technologies Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6027623
    Abstract: A device for fractionating macromolecules in a fluid medium includes a plurality of individual obstacles which are arranged on a substrate in rows and columns. An electric field is provided and oriented to move the macromolecules in migration through fluid channels that are established between the columns of obstacles. Each obstacle has mutually symmetrical right and left front walls which are inclined to a respective fluid channel. Consequently, as macromolecules diffuse through the fluid medium from a fluid channel during their migration through the device, the front walls of the obstacles redirect them back into the same fluid channel from which they diffused. As a result, the faster diffusing, smaller macromolecules take longer to migrate through the fluid channels of the device. Eventually, because the diffusion rate of the macromolecules depends on their size, the positions of the macromolecules in the device reflect their respective diffusion rates, and therefore their size.
    Type: Grant
    Filed: April 22, 1998
    Date of Patent: February 22, 2000
    Assignee: Toyo Technologies, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6014203
    Abstract: A digital electron lithography system includes a plurality of cathodes oriented in a plane and positioned substantially parallel to a substrate surface in a vacuum chamber. The substrate surface is coated with a layer of an electron resist material and, in operation, individual cathodes in the array are selectively activated to emit electrons which alter the resist material. In order to create a predetermined pattern on the substrate, a focusing magnet is provided to direct the electrons from the respective cathodes to be focused on the substrate surface along substantially parallel electron paths. Additionally, a steering magnet is provided to change electron path directions so that electrons are steered to sequentially affect a plurality of pixels in a pixel matrix on the substrate surface. To minimize ion damage to the cathodes the electron paths are oriented at an angle to the perpendicular direction between the plane of the array and the substrate surface.
    Type: Grant
    Filed: January 27, 1998
    Date of Patent: January 11, 2000
    Assignee: Toyo Technologies, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 5993678
    Abstract: A device, and a method for using the device, for altering the surface of a substrate with a plasma includes a vessel having a chamber, a magnet and a plasma generator. Both the generator and the magnet are positioned outside the vessel while the substrate to be altered is placed in the chamber. The magnetic field is established substantially parallel to the substrate surface that is to be altered to insulate the plasma from the substrate surface. Also, a radio frequency wave is propagated from the generator into the chamber to generate the plasma in chamber which alters the surface. Specifically, the plasma is generated in ionization zones located between the substrate surface and the vessel walls. A region in the chamber is thus defined between the ionization zones where the plasma is established with substantially uniform density. Additionally, electrodes can be placed to voltage bias directly or capacitively the plasma for ion etching or deposition on the substrate surface.
    Type: Grant
    Filed: July 31, 1996
    Date of Patent: November 30, 1999
    Assignee: Toyo Technologies Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 5868897
    Abstract: A device, and a method for using the device, for altering the surface of a substrate with a plasma includes a vessel having a chamber, a magnet and a plasma generator. Both the generator and the magnet are positioned outside the vessel while the substrate to be altered is placed in the chamber. The magnetic field is established substantially parallel to the substrate surface that is to be altered to insulate the plasma from the substrate surface. Also, a radio frequency wave is propagated from the generator into the chamber to generate the plasma in chamber which alters the surface. Specifically, the plasma is generated in ionization zones located between the substrate surface and the vessel walls. A region in the chamber is thus defined between the ionization zones where the plasma is established with substantially uniform density. Additionally, electrodes can be placed to voltage bias directly or capacitively the plasma for ion etching or deposition on the substrate surface.
    Type: Grant
    Filed: September 18, 1996
    Date of Patent: February 9, 1999
    Assignee: Toyo Technologies, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 5763017
    Abstract: A method for manufacturing a micro-bubble textured material includes performing simultaneous implantation of inert gas atoms and plasma assisted chemical vapor deposition. Plasma that contains ions of an inert gas and neutrals necessary for PCVD is produced over a substrate. The substrate being deposited with the material to be textured is then biased with a negative voltage to accelerate the ions from the plasma. Control over the bias voltage determines the penetration depth into the materials and control over the ion current to the substrate determines the fractional atomic density of the implanted gas atoms and the penetration depth. Simultaneous deposition causes the location of the layer of the implanted atoms to move at the deposition rate, resulting in a uniform implantation of the atoms.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: June 9, 1998
    Assignee: Toyo Technologies Inc.
    Inventor: Tihiro Ohkawa