Abstract: A vacuum arc plasma gun deposition system includes a cathode, several anode assemblies that define a plasma channel, a current source for causing electrical current to flow from the anode assemblies to the cathode, a mechanism for moving the anode axially to keep the active surface of the cathode substantially at a fixed position relative to the anode assemblies, mechanisms for moving the anode assemblies to keep the cross sectional size of the plasma channel substantially constant, a mechanism for cooling the cathode by conducting heat away from lateral surfaces of the cathode, and mechanisms for ensuring that a non-flat substrate is coated uniformly. The scope of the invention includes methods of making coated products by depositing coatings on substrates using this vacuum arc plasma gun deposition system, and the coated products so made.
Type:
Grant
Filed:
May 6, 2002
Date of Patent:
March 16, 2004
Assignee:
TransArc Ltd.
Inventors:
Raymond Reuven Boxman, Samuel Goldsmith, Yair David
Abstract: A vacuum arc plasma gun deposition system includes a cathode, several anode assemblies that define a plasma channel, a current source for causing electrical current to flow from the anode assemblies to the cathode, a mechanism for moving the anode axially to keep the active surface of the cathode substantially at a fixed position relative to the anode assemblies, mechanisms for moving the anode assemblies to keep the cross sectional size of the plasma channel substantially constant, a mechanism for cooling the cathode by conducting heat away from lateral surfaces of the cathode, and mechanisms for ensuring that a non-flat substrate is coated uniformly. The scope of the invention includes methods of making coated products by depositing coatings on substrates using this vacuum arc plasma gun deposition system, and the coated products so made.
Type:
Application
Filed:
May 6, 2002
Publication date:
March 13, 2003
Applicant:
TRANSARC LTD.
Inventors:
Raymond Reuven Boxman, Samuel Goldsmith, Yair David